Method and system for growth of graphene nanostripes by plasma enhanced chemical vapor deposition

A method of forming vertical graphene nanostripes comprising one or several monolayers and characterized by a thickness normal to the one or several monolayers, a length orthogonal to the thickness, and a width orthogonal to the thickness, the method comprising:

• providing a substrate consisting of copper foil or nickel foam;
• subjecting the substrate to a reduced pressure environment in a processing chamber;
• providing methane gas and C6-containing precursor;
• flowing the methane gas and the C6-containing precursor into the processing chamber;
• establishing a partial pressure ratio of C6-containing precursor to methane gas in the processing chamber, wherein the partial pressure ratio is between 0 and 3;
• generating a plasma;
• thereafter, exposing the at least a portion of the substrate to the methane gas, the C6-containing precursor, and the plasma;
• and
• growing the vertical graphene nanostripes coupled to the at least a portion of the substrate, wherein one or more of the vertical graphene nanostripes are characterized by the thickness measured parallel to the substrate, the length extending parallel to the substrate in a first direction, and the width extending orthogonal to the substrate in a second direction, and an aspect ratio of the length to the width ranging from 10:1 to 130:1.