Film Forming Apparatus and Film Forming Method

A film forming method using a film forming apparatus that supplies a film forming gas to a substrate, the method comprising:

• forming a vacuum atmosphere in a process chamber of a vacuum container;
• mounting a substrate on an upper surface of a stage, a central portion of a lower surface of the stage being supported in the process chamber by a support, a peripheral portion of the lower surface of the stage being spaced apart from a bottom portion of the vacuum container;
• forming a film by supplying a film forming gas to the substrate from a film forming gas supply installed above the stage to face the stage;
• and
• exhausting from an exhaust port opened in a side wall of the vacuum container along an outer periphery of the stage,
• wherein the film forming apparatus includes:
• a first annular body protruding toward the stage from the side wall of the vacuum container at a location below the exhaust port, an inner peripheral portion of the first annular body facing a circumferential surface of the stage with a gap interposed between the inner peripheral portion and the circumferential surface, and the first annular body vertically partitioning the process chamber;
• a second annular body extending downward from the inner peripheral portion of the first annular body such that a lower end portion of the second annular body is positioned lower than the peripheral portion of the stage;
• and
• a third annular body extending from the peripheral portion of the stage, such that the third annular body has a flow path defining surface extending along an inner peripheral surface of the second annular body and a lower end surface of the second annular body, and wherein the method further comprises:
• trapping the film forming gas leaking into the gap in a bent flow path, which is formed between the second annular body and the third annular body, and forming the film on the flow path defining surface and the second annular body.