Silicon compounds and methods for depositing films using same

A composition for use in a deposition process to produce a dielectric film, the composition comprising a silicon compound having the following Formula I:

• wherein R1 is selected from the group consisting of hydrogen, a linear or branched C1 to C10 alkyl group, a linear or branched C2 to C10 alkenyl group, a linear or branched C2 to C10 alkynyl group, a C3 to C10 cyclic alkyl group, a C3 to C10 hetero-cyclic alkyl group, a C5 to C10 aryl group, and a C3 to C10 hetero-aryl group;
• R2 is a C2 to C4 alkyl di-radical which forms a four-membered, five-membered, or six-membered saturated cyclic ring with the Si and oxygen atoms with optional C1 to C6 alkyl substituents, R3 is selected from the group consisting of a linear or branched C1 to C10 alkyl group, a linear or branched C2 to C10 alkenyl group, a linear or branched C2 to C10 alkynyl group, a C3 to C10 cyclic alkyl group, a C3 to C10 hetero-cyclic alkyl group, a C5 to C10 aryl group, and a C3 to C10 hetero-aryl group, and alkoxy OR4 wherein R4 is selected from the group consisting of a linear or branched C1 to C10 alkyl group, a linear or branched C2 to C10 alkenyl group, and a linear or branched C2 to C10 alkynyl group.

A composition for a vapor deposition of a dielectric film comprising a silicon compound having the following Formula I:

• wherein R1 is selected from the group consisting of hydrogen, a linear or branched C1 to C10 alkyl group, a linear or branched C2 to C10 alkenyl group, a linear or branched C2 to C10 alkynyl group, a C3 to C10 cyclic alkyl group, a C3 to C10 hetero-cyclic alkyl group, a C5 to C10 aryl group, and a C3 to C10 hetero-aryl group;
• R2 is a C2 to C4 alkyl di-radical which forms a four-membered, five-membered, or six-membered saturated cyclic ring with the Si and oxygen atoms with optional C1 to Ce alkyl substituents, R3 is selected from the group consisting of a linear or branched C1 to C10 alkyl group, a linear or branched C2 to C10 alkenyl group, a linear or branched C2 to C10 alkynyl group, a C3 to C10 cyclic alkyl group, a C3 to C10 hetero-cyclic alkyl group, a C5 to C10 aryl group, and a C3 to C10 hetero-aryl group, and alkoxy OR4 wherein R4 is selected from the group consisting of a linear or branched C1 to C10 alkyl group, a linear or branched C2 to C10 alkenyl group, and a linear or branched C2 to C10 alkynyl group and wherein the compound is substantially free of at least one impurity selected from the group consisting of halides, organosilane impurities, and water.