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US 2020/0047467 A1Published application
Resin composition for interlayer, film material for interlayer, and laminated glass manufacturing method
AssigneeHitachi Chemical Company, Ltd.
InventorsKouhei MUKAIGAITO, Hiroaki TAKAHASHI, Kazutoshi FURUZONO, Eisaku ISHIKAWA
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Abstract
The present invention relates to a resin composition for an interlayer, comprising a copolymer of a monomer mixture containing a (meth)acryloyl compound and a siloxane compound having an ethylenically unsaturated group wherein an ethylenically unsaturated group equivalent is 2000 to 20000 g/mol.
Claims8
A resin composition for an interlayer, comprising a copolymer of a monomer mixture containing a (meth)acryloyl compound and a siloxane compound having an ethylenically unsaturated group wherein an ethylenically unsaturated group equivalent is 2000 to 20000 g/mol.
Dependencies are inferred from the claim text.