Method for producing a 3d structure by means of laser lithography, and corresponding computer program product
AssigneeNanoscribe GmbH
InventorsYann TANGUY, Nicole Lindenmann
Life of this patent
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Abstract
A system, computer program product and method for producing a three-dimensional overall structure by means of laser lithography, the overall structure being approximated by at least one partial structure, wherein, for the purposes of writing the partial structure, an exposure dose is radiated into the lithography material in a focal region of a laser writing beam while exploiting multi-photon absorption. Here, in the partial structure, the exposure dose in those edge portions that immediately adjoin an external surface of the overall structure to be produced is modified in comparison with the remaining partial structure.
Claims20
A method for producing a three-dimensional overall structure by means of laser lithography in a lithography material wherein the three-dimensional overall structure is defined in that at least one partial structure is defined, such that said at least one partial structure approximates the three-dimensional overall structure,
- wherein, for purposes of writing the at least one partial structure, an exposure dose is radiated into the lithography material in a focal region of a laser writing beam while exploiting multi-photon absorption, and
- wherein the exposure dose is changed in comparison to a remaining partial structure in the at least one partial structure in such edge portions, which directly adjoin an external surface of the three-dimensional overall structure to be produced.
Dependencies are inferred from the claim text.