Pattern forming method
AssigneeCanon Kabushiki Kaisha
InventorsTomonori Otani, Toshiki Ito
Life of this patent
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AssigneeCanon Kabushiki Kaisha
InventorsTomonori Otani, Toshiki Ito
Estimating the term…
Pattern forming method includes, for each shot area group (SAG) in the following order: discretely dropping curable composition droplets to layer the droplets on a plurality of shot areas included in a certain SAG on substrate; waiting for a time of (mmax−m)×Td, where Td is a time for the dropping on one shot area, m is the number of shot areas included in the certain SAG, and mmax is the maximum value of m; and imprinting in order that the dropping is performed on the plurality of shot areas. The time Td and a time Ti for the imprinting on one shot area are equal to each other. The number of shot areas included in at least one SAG is different from the number of shot areas included in another at least one SAG. In the waiting, the dropping and the imprinting are not performed.
A method of forming a pattern in a plurality of shot areas included in a plurality of shot area groups on a substrate, the method comprising, for each shot area group in the following order:
A method of forming a pattern in a plurality of shot areas included in r shot area groups on a substrate where r is 2 or more, the method comprising, in the following order:
Dependencies are inferred from the claim text.