Plasma generation device

A plasma generation device comprising:

• an electric power supply device configured to supply electric power to multiple electrodes arranged in a reaction chamber;
• a processing gas supply device configured to supply a processing gas to the reaction chamber;
• and
• a control device configured to control operation of the electric power supply device and the processing gas supply device,
• wherein
• the control device is configured to control the operation of the electric power supply device and the processing gas supply device to stop supply of electric power to the electrodes but continue supply of the processing gas to the reaction chamber based on a stop instruction, and restart supply of electric power to the electrodes based on a resume instruction.

A plasma generation device comprising:

• an electric power supply device configured to supply electric power to multiple electrodes arranged in a reaction chamber;
• a processing gas supply device configured to supply a processing gas to the reaction chamber;
• and
• a control device configured to control operation of the electric power supply device and the processing gas supply device,
• wherein
• the control device is configured to control operation of the processing gas supply device and the electric power supply device in either of a first operation mode in which, when a stop signal is received while electric power is being supplied to the electrodes in a state with the processing gas being supplied to the reaction chamber, supply of electric power to the electrodes is stopped and supply of the processing gas to the reaction chamber is stopped, and a second operation mode in which supply of electric power to the electrodes is stopped, but the processing gas continues to be supplied to the reaction chamber.