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US 2020/0027759 A1Published application
Substrate processing apparatus
AssigneeEbara Corporation
InventorsKeiichi Kurashina, Toshio Yokoyama
Life of this patent
Estimating the term…
Abstract
The substrate processing apparatus includes a processing chamber including an outer chamber configured to hold a processing liquid and an inner chamber capable of surrounding the substrate held by the substrate holder; a liquid delivery pipe having one end coupled to a bottom of the inner chamber and other end coupled to the outer chamber; a pump configured to suck the processing liquid from the inner chamber through the liquid delivery pipe and to deliver the processing liquid to the outer chamber through the liquid delivery pipe; and a guide cover having a through-hole in which the substrate holder can be inserted. The guide cover is located below an upper end of the outer chamber and above the inner chamber.
Claims15
A substrate processing apparatus comprising:
- a substrate holder for holding a substrate;
- a processing chamber configured to hold a processing liquid for processing the substrate, the substrate holder being disposed in the processing chamber;
- processing-liquid nozzles disposed in the processing chamber and oriented to the substrate held by the substrate holder, the processing-liquid nozzles being oriented obliquely downwardly, the processing-liquid nozzles being arranged at both sides of the substrate held by the substrate holder;
- a liquid delivery pipe having one end coupled to a bottom of the processing chamber and other end coupled to the processing-liquid nozzles;
- and
- a pump coupled to the liquid delivery pipe and configured to suck the processing liquid from a bottom of the processing chamber through the liquid delivery pipe and to deliver the processing liquid to the processing-liquid nozzles through the liquid delivery pipe.
3 more elements
A substrate processing apparatus comprising:
- a substrate holder for holding a substrate;
- a processing chamber configured to hold a processing liquid for processing the substrate, the substrate holder being disposed in the processing chamber;
- a liquid delivery pipe having one end coupled to a bottom of the processing chamber and other end communicating with an interior of the processing chamber;
- a pump coupled to the liquid delivery pipe and configured to suck the processing liquid from the bottom of the processing chamber through the liquid delivery pipe and to return the processing liquid into the processing chamber through the liquid delivery pipe;
- and
- baffle plates disposed in the inner chamber and arranged adjacent to the substrate held by the substrate holder.
3 more elements
A substrate processing apparatus comprising:
- a substrate holder for holding a substrate;
- a processing chamber configured to hold a processing liquid for processing the substrate, the substrate holder being disposed in the processing chamber;
- a liquid delivery pipe having one end coupled to a bottom of the processing chamber and other end communicating with an interior of the processing chamber;
- a pump coupled to the liquid delivery pipe and configured to suck the processing liquid from a bottom of the processing chamber through the liquid delivery pipe and to return the processing liquid into the processing chamber through the liquid delivery pipe;
- and
- a holder oscillation device configured to cause the substrate holder to oscillate vertically, the substrate holder having at least one paddle for agitating the processing liquid.
3 more elements
A substrate processing apparatus comprising:
- a substrate holder for holding a substrate;
- a processing chamber configured to hold a processing liquid for processing the substrate, the substrate holder being disposed in the processing chamber;
- a liquid delivery pipe having one end coupled to a bottom of the processing chamber and other end communicating with an interior of the processing chamber;
- a pump coupled to the liquid delivery pipe and configured to suck the processing liquid from the bottom of the processing chamber through the liquid delivery pipe and to return the processing liquid into the processing chamber through the liquid delivery pipe;
- and
- inert-gas supply nozzles disposed in the processing chamber and oriented to the substrate held by the substrate holder.
3 more elements
A substrate processing apparatus comprising:
- a substrate holder for holding a substrate;
- a processing chamber configured to hold a processing liquid for processing the substrate, the substrate holder being disposed in the processing chamber;
- a porous member secured to an upper portion of the processing chamber;
- a liquid delivery pipe having one end coupled to a bottom of the processing chamber and other end located above the porous member;
- and
- a pump coupled to the liquid delivery pipe and configured to suck the processing liquid from the bottom of the processing chamber through the liquid delivery pipe and to supply the processing liquid onto the porous member through the liquid delivery pipe.
3 more elements
A substrate processing apparatus comprising:
- a substrate holder for holding a substrate;
- a processing chamber configured to hold a processing liquid for processing the substrate, the substrate holder being disposed in the processing chamber;
- a liquid delivery pipe having one end coupled to a bottom of the processing chamber and other end communicating with an interior of the processing chamber;
- a pump coupled to the liquid delivery pipe and configured to suck the processing liquid from the bottom of the processing chamber through the liquid delivery pipe and to return the processing liquid into the processing chamber through the liquid delivery pipe;
- and
- an elastic membrane incorporated in a side wall of the processing chamber, the elastic membrane facing a surface of the substrate held by the substrate holder.
3 more elements
Dependencies are inferred from the claim text.