Substrate support apparatus and plasma processing apparatus having the same
AssigneeSamsung Electronics Co., Ltd.
InventorsKwang-Nam KIM, Sung-Yeon KIM, Hyung-Jun KIM, Jong-Woo SUN, Sang-Rok OH, Jung-Pyo HONG
Life of this patent
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Abstract
A substrate support apparatus includes a substrate stage to support a substrate, and a ground ring assembly along a circumference of the substrate stage, the ground ring assembly including a ground ring body, the ground ring body having a plurality of recesses along a circumferential portion thereof, and a plurality of ground blocks movable to be received into respective recesses of the plurality of recesses, the plurality of ground blocks including a conductive material to be electrically grounded.
Claims20
A substrate support apparatus, comprising:
- a substrate stage to support a substrate;
- and
- a ground ring assembly along a circumference of the substrate stage, the ground ring assembly including:
- a ground ring body, the ground ring body having a plurality of recesses along a circumferential portion thereof, and
- a plurality of ground blocks movable to be received into respective recesses of the plurality of recesses, the plurality of ground blocks including a conductive material to be electrically grounded.
A substrate support apparatus, comprising:
- a substrate stage to support a substrate;
- a ground ring assembly along a circumference of the substrate stage, the ground ring assembly including:
- a ground ring body, the ground ring body having a plurality of recesses along a circumferential portion thereof, and
- a plurality of ground blocks movable to be received into respective recesses of the plurality of recesses, the plurality of ground blocks including a conductive material to be electrically grounded;
- and
- a baffle member above the ground ring body along the circumference of the substrate stage, the baffle member being electrically connected to the ground ring body.
A plasma processing apparatus, comprising:
- a chamber to provide a space for processing a substrate;
- a substrate stage to support the substrate within the chamber, the substrate stage including a lower electrode;
- an upper electrode in an upper portion of the chamber to face the lower electrode;
- a first power supply to apply a plasma power to the upper electrode;
- a second power supply to apply a bias power to the lower electrode;
- and
- a ground ring assembly along a circumference of the substrate stage, the ground ring assembly including:
- an annular-shaped ground ring body, the ground ring body having a plurality of recesses along a circumferential portion thereof, and
- a plurality of ground blocks, the plurality of ground blocks being movable to be received into respective ones of the plurality of recesses.
Dependencies are inferred from the claim text.