Substrate processing apparatus
AssigneeTokyo Electron Limited
InventorsShinji KUBOTA, Naohiko OKUNISHI, Yosuke TAMURO, Shota KANEKO
Life of this patent
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Abstract
A substrate processing apparatus includes a chamber, a pedestal provided in the chamber and having a substrate holding region to hold a substrate thereon, and a gas supply part to supply a gas into the chamber. A plurality of electron gun arrays two-dimensionally arranged so as to cover the substrate holding region is provided and configured to emit electrons toward the gas to cause interactions between the emitted electrons and the gas. A plurality of electron energy control parts is correspondingly provided at each of the electron gun arrays and configured to control energy of the electrons emitted from each of the electron gun arrays independently of each other.
Claims20
A substrate processing apparatus, comprising:
- a chamber;
- a pedestal provided in the chamber and having a substrate holding region to hold a substrate thereon;
- a gas supply part to supply a gas into the chamber;
- a plurality of electron gun arrays two-dimensionally arranged so as to cover the substrate holding region and configured to emit electrons toward the gas to cause interactions between the emitted electrons and the gas;
- and
- a plurality of electron energy control parts correspondingly provided at each of the electron gun arrays and configured to control energy of the electrons emitted from each of the electron gun arrays independently of each other.
A substrate processing apparatus, comprising:
- a chamber;
- a pedestal provided in the chamber and having a substrate holding region to hold a substrate thereon;
- a gas supply part to supply a gas into the chamber;
- a plurality of electron gun arrays two-dimensionally arranged so as to cover the substrate holding region and configured to emit electrons toward the gas to cause interactions between the emitted electrons and the gas;
- a plurality of electron energy control parts correspondingly provided at each of the electron gun arrays and configured to control energy of the electrons emitted from each of the electron gun arrays independently of each other;
- a controller configured to control the electron energy control parts so as to set the energy of the electrons to a first energy such that the gas supplied into the chamber becomes negative ions by interactions between the electrons and the gas and then to set the energy of the electrons to a second energy such that the gas supplied into the chamber becomes positive ions by interactions between the electrons and the gas.
A substrate processing apparatus, comprising:
- a chamber;
- a pedestal provided in the chamber and having a substrate holding region to hold a substrate thereon;
- a gas supply part to supply a gas into the chamber;
- a plurality of electron'gun arrays two-dimensionally arranged so as to cover the substrate holding region and configured to emit electrons toward the gas to cause interactions between the emitted electrons and the gas;
- a current control part configured to control a current value flowing through each of the electron gun arrays;
- a current measurement unit configured to measure the current value flowing through each of the electron gun arrays;
- a plurality of electron energy control parts correspondingly provided at each of the electron gun arrays and configured to control energy of the electrons emitted from each of the electron gun arrays independently of each other;
- and
- a controller configured to perform the flowing steps, including:
- causing the current measurement unit to measure the current value of each of the electron gun arrays while measuring a voltage value of both ends of the current measurement unit;
- obtaining the current-voltage characteristics of each of the electron gun arrays;
- determining an extraction voltage of each of the electron gun arrays such that the current value of each of the electron gun arrays becomes constant;
- and
- setting an acceleration voltage of each of the electron gun arrays to a certain voltage.
Dependencies are inferred from the claim text.