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US 2020/0026205 A1Published application
Apparatus and method for treating substrate
AssigneeSemes Co., Ltd.
InventorsHWANGSOO PARK, JUN HO YOU
Life of this patent
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Abstract
A method for treating a substrate includes a substrate treating step of treating the substrate by dispensing a treating liquid onto the substrate supported on a support plate in a processing space of a processing vessel and a vessel cleaning step of cleaning the processing vessel by dispensing a cleaning solution onto a jig supported on the rotating support plate. In the vessel cleaning step, the jig is located such that the center of the jig is offset from the center of the support plate.
Claims11
A method for treating a substrate, the method comprising:
- a substrate treating step of treating the substrate by dispensing a treating liquid onto the substrate supported on a support plate in a processing space of a processing vessel;
- and
- a vessel cleaning step of cleaning the processing vessel by dispensing a cleaning solution onto a jig supported on the rotating support plate,
- wherein in the vessel cleaning step, the jig is located such that the center of the jig is offset from the center of the support plate.
1 more element
An apparatus for treating a substrate, the apparatus comprising:
- a processing vessel having a processing space inside;
- a substrate support unit configured to support and rotate the substrate or a jig in the processing space;
- a liquid dispensing unit including a treating liquid dispensing member configured to dispense a treating liquid for treating the substrate and a cleaning solution dispensing member configured to dispense a cleaning solution for cleaning the processing vessel;
- and
- a controller configured to control the substrate support unit and the liquid dispensing unit,
- wherein the substrate support unit includes a support plate on which the substrate is placed,
- wherein the controller is configured to perform:
- a substrate treating step of treating the substrate by dispensing the treating liquid onto the substrate placed on the support plate;
- and
- a vessel cleaning step of cleaning the processing vessel by dispensing the cleaning solution onto the rotating jig placed on the support plate, and
- wherein in the vessel cleaning step, the jig is supported on the support plate such that the center of the jig is offset from the center of the support plate.
8 more elements
Dependencies are inferred from the claim text.