Cleaning apparatus, imprint apparatus, lithography apparatus, and cleaning method
AssigneeCanon Kabushiki Kaisha
InventorShingo Ishida
Life of this patent
Estimating the term…
Abstract
To provide a cleaning apparatus advantageous for cleaning, for example, an original plate used to transfer a pattern to a substrate. Provided is a cleaning apparatus that cleans an original plate used when a pattern is transferred to a substrate, the cleaning apparatus including a region dividing unit which divides the original plate into a plurality of regions on the basis of information of the original plate, a conditions generator which generates cleaning conditions for each of the separate regions, and a cleaner which cleans the original plate on the basis of the cleaning conditions.
Claims17
A cleaning apparatus that cleans an original plate used when a pattern is transferred to a substrate, the cleaning apparatus comprising:
- a region dividing unit configured to divide the original plate into a plurality of regions on the basis of information of the original plate;
- a conditions generator configured to generate cleaning conditions for each of the plurality of regions such that a first cleaning condition is generated for a first region among the plurality of regions and a second cleaning condition different from the first cleaning condition is generated for a second region different from the first region among the plurality of regions;
- and
- a cleaner configured to clean the first region of the original plate on the basis of the first cleaning condition and to clean the second region of the original plate on the basis of the second cleaning condition different from the first cleaning condition.
An imprint apparatus for forming a pattern in an imprinting material on a substrate using a mold as an original plate, the imprint apparatus comprising:
- a cleaning apparatus configured to clean the original plate,
- wherein the cleaning apparatus includes:
- a region dividing unit configured to divide the original plate into a plurality of regions on the basis of information of the original plate,
- a conditions generator configured to generate cleaning conditions for each of the plurality of regions such that a first cleaning condition is generated for a first region among the plurality of regions and a second cleaning condition different from the first cleaning condition is generated for a second region different from the first region among the plurality of regions, and
- a cleaner configured to clean the first region of the original plate on the basis of the first cleaning condition and to clean the second region of the original plate on the basis of the second cleaning condition different from the first cleaning condition.
A lithography apparatus that transfers a pattern to a substrate using a mask as an original plate, the lithography apparatus comprising:
- a cleaning apparatus configured to clean the original plate,
- wherein the cleaning apparatus includes:
- a region dividing unit configured to divide the original plate into a plurality of regions on the basis of information of the original plate,
- a conditions generator configured to generate cleaning conditions for each of the plurality of regions such that a first cleaning condition is generated for a first region among the plurality of regions and a second cleaning condition different from the first cleaning condition is generated for a second region different from the first region among the plurality of regions, and
- a cleaner configured to clean the first region of the original plate on the basis of the first cleaning condition and to clean the second region of the original plate on the basis of the second cleaning condition different from the first cleaning condition.
A cleaning method of cleaning an original plate used when a pattern is transferred to a substrate, the cleaning method comprising:
- dividing the original plate into a plurality of regions on the basis of information of the original plate;
- generating cleaning conditions for each of the plurality of regions such that a first cleaning condition is generated for a first region among the plurality of regions and a second cleaning condition different from the first cleaning condition is generated for a second region different from the first region among the plurality of regions;
- and
- cleaning the first region of the original plate on the basis of the first cleaning condition and cleaning the second region of the original plate on the basis of the second cleaning condition different from the first cleaning condition.
Dependencies are inferred from the claim text.