Projection lens, projection exposure apparatus and projection exposure method

A projection lens, comprising:

• a multiplicity of lens elements arranged along an optical axis between the object and image planes,
• wherein:
• the lens elements are configured to image a pattern in an object plane of the projection lens into image plane of the projection lens with a reducing imaging scale;
• the lens elements comprises a first lens elements comprising a first material with a first Abbe number;
• the lens elements comprising a second lens elements comprising a second material with a second Abbe number;
• the second Abbe number is greater than the first Abbe number;
• the projection lens comprises exclusively the following lens element groups:
• a first lens element group following the object plane, the first lens element group having positive refractive power following the object plane;
• a second lens element group following the first lens element group, the second lens element group having negative refractive power, the second lens element group configured to produce a waist around a region of minimal marginal ray heights between the object plane and the image plane;
• a third lens element group following the second lens element group, the third lens element group being between the second lens element group and a stop position suitable for attaching an aperture stop, the third lens element group having positive refractive power;
• and
• a fourth lens element group between the stop position and the image plane, the fourth lens element group having positive refractive power;
• the first and second lens elements are configured to correct imaging aberrations at the same time for wavelength ranges of emission lines of the mercury vapor lamp at approximately 365 nm, approximately 405 nm and approximately 436 nm;
• and
• the projection lens is a refractive projection lens.