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US 2020/0026190 A1Published application
Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, and black matrix
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsHitoshi Maruyama, Tamotsu Oowada
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Abstract
A black photosensitive resin composition comprising (A) an acid crosslinkable group-containing silicone resin, (B) carbon black, and (C) a photoacid generator is coated onto a substrate to form a photosensitive resin coating which has improved reliability with respect to adhesion and crack resistance, resolution and flexibility while maintaining satisfactory light shielding properties.
Claims19
A photosensitive resin composition comprising (A) a base resin comprising an acid crosslinkable group-containing silicone resin, (B) carbon black, and (C) a photoacid generator.
Dependencies are inferred from the claim text.