Photodissociation Frame Window, Systems Including a Photodissociation Frame Window, and Methods of Using a Photodissociation Frame Window
AssigneeCanon Kabushiki Kaisha
InventorEdward Brian Fletcher
Life of this patent
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Abstract
An apparatus, method, and frame window configured to clean mesa sidewalls of a template with photodissociation radiation. Material on the mesa sidewalls are removed from the mesa sidewalls by exposing the portion of a first gap adjacent to the mesa sidewalls to the photodissociation radiation.
Claims24
An apparatus configured to clean mesa sidewalls of a template, wherein the template has a pattern area on a first surface of a mesa, the mesa sidewalls surround the mesa, and a recessed surface surrounds the mesa sidewalls, the apparatus comprising:
- a template chuck configured to hold the template;
- a photodissociation light source configured to emit photodissociation radiation;
- a photodissociation frame window comprising:
- a central region;
- and
- a window region surrounding the central region;
- and
- wherein transmittance of the photodissociation radiation by the central region is less than a damage threshold;
- and
- wherein transmittance of the photodissociation radiation by the window region is greater than a reaction threshold;
- a positioning system configured to form a first gap between the photodissociation frame window and the template;
- and
- wherein the first gap is bounded by:
- the mesa sidewalls;
- the recessed surface;
- and the window region of the photodissociation frame window;
- wherein the photodissociation light source is positioned to send the photodissociation radiation through the window region so as to expose a portion of the first gap adjacent to the mesa sidewalls to the photodissociation radiation;
- and
- wherein material on the mesa sidewalls is removed from the mesa sidewalls by exposing the portion of the first gap adjacent to the mesa sidewalls to the photodissociation radiation.
A method for cleaning mesa sidewalls of a template, wherein the template has a pattern area on a first surface of a mesa, the mesa sidewalls surround the mesa, and a recessed surface surrounds the mesa sidewalls, the method comprising:
- holding the template;
- forming a first gap between a photodissociation frame window and the template;
- and
- wherein the photodissociation frame window comprises:
- a central region;
- and
- a window region surrounding the central region;
- wherein transmittance of photodissociation radiation by the central region is less than the damage threshold;
- and
- wherein transmittance of the photodissociation radiation by the window region is greater than a reaction threshold;
- wherein the first gap is bounded by:
- the mesa sidewalls;
- the recessed surface;
- and the window region of the photodissociation frame window;
- sending the photodissociation radiation through the window region to expose a portion of the first gap adjacent to the mesa sidewalls to the photodissociation radiation;
- wherein material on the mesa sidewalls is removed from the mesa sidewalls by exposing the portion of the first gap adjacent to the mesa sidewalls to the photodissociation radiation.
A photodissociation frame window, comprising:
- a central region;
- and
- a window region surrounding the central region;
- wherein transmittance of photodissociation radiation by the central region is less than the damage threshold;
- and
- wherein transmittance of the photodissociation radiation by the window region is greater than a reaction threshold.
Dependencies are inferred from the claim text.