Metrology Apparatus and Method for Determining a Characteristic Relating to One or More Structures on a Substrate

A patterning device comprising:

• a modified reticle feature adapted to form, during a lithographic process, a modified substrate feature on a substrate with a geometry dependent on the characteristic of interest during its formation, and wherein the modified substrate feature is configured to have a primary function other than metrology.

A lithographic system for determining a characteristic of interest relating to at least one structure on a substrate formed by a lithographic process, the lithographic system comprising:

• a patterning device comprising a modified reticle feature adapted to form, during a lithographic process, a modified substrate feature on the substrate with a geometry dependent on the characteristic of interest during its formation, and wherein the modified substrate feature is configured to have a primary function other than metrology;
• and
• a metrology device for measuring the modified substrate feature to determine the characteristic of interest.

A method of determining a characteristic of interest relating to a structure on a substrate formed by a lithographic process, the method comprising:

• measuring a modified substrate feature to determine the characteristic of interest, wherein the modified substrate feature being formed on the substrate using a corresponding modified reticle feature on a patterning device, the modified substrate feature being formed for a primary function other than metrology, the modified reticle feature being such that the modified substrate feature is formed with a geometry dependent on the characteristic of interest during formation.