Back to results
US 2020/0026178 A1Published application
Extreme Ultraviolet Mask Absorber Materials
AssigneeApplied Materials, Inc.
InventorsVibhu Jindal, Hui Ni Grace Fong, Binni Varghese, Shuwei Liu, Abbas Rastegar
Life of this patent
Estimating the term…
Abstract
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from an alloy of tantalum and nickel.
Claims20
A method of manufacturing an extreme ultraviolet (EUV) mask blank comprising:
- forming a multilayer stack of reflective layers on the substrate, the multilayer stack of reflective layers including a plurality of reflective layer pairs;
- forming a capping layer on the multilayer stack of reflective layers;
- and
- forming an absorber layer on the capping layer, the absorber layer comprising an alloy of tantalum and nickel,
- wherein the alloy of tantalum and nickel is selected from an alloy having about 70 wt. % to about 85 wt. % tantalum and about 15 wt. % to about 30 wt. % nickel, an alloy having about 45 wt. % to about 55 wt. % tantalum and about 45 wt. % to about 55 wt. % nickel, and an alloy having about 30 wt. % to about 45 wt. % tantalum and about 55 wt. % to about 70 wt. % nickel.
2 more elements
An extreme ultraviolet (EUV) mask blank comprising:
- a substrate;
- a multilayer stack of reflective layers on the substrate, the multilayer stack of reflective layers including a plurality of reflective layers including reflective layer pairs;
- a capping layer on the multilayer stack of reflecting layers;
- and
- an absorber layer comprising an alloy of tantalum and nickel, wherein the alloy of tantalum and nickel is selected from an alloy having about 70 wt. % to about 85 wt. % tantalum and about 15 wt. % to about 30 wt. % nickel, an alloy having about 45 wt. % to about 55 wt. % tantalum and about 45 wt. % to about 55 wt. % nickel, and an alloy having about 30 wt. % to about 45 wt. % tantalum and about 55 wt. % to about 70 wt. % nickel.
2 more elements
An extreme ultraviolet (EUV) mask blank comprising:
- a substrate;
- a multilayer stack of reflective layers on the substrate, the multilayer stack of reflective layers including a plurality of reflective layers including reflective layer pairs of molybdenum (Mo) and silicon (Si);
- a capping layer on the multilayer stack of reflecting layers;
- and
- an absorber layer comprising an alloy of tantalum and nickel,
- wherein the alloy of tantalum and nickel is selected from an alloy having about 70 wt. % to about 75 wt. % tantalum and about 30 wt. % to about 25 wt. % nickel, an alloy having about 48 wt. % to about 55 wt. % tantalum and about 45 wt. % to about 52 wt. % nickel, and an alloy having about 35 wt. % to about 45 wt. % tantalum and about 55 wt. % to about 65 wt. % nickel.
3 more elements
Dependencies are inferred from the claim text.