Systems and methods for gamma radiation based stabilization of replicated mirror structures at the nanometer-scale
AssigneeThe Aerospace Corporation
InventorsRafael J. ZALDIVAR, Geena L. FERRELLI, Hyun I. KIM
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Abstract
A system includes a curing assembly for low temperature curing and residual stress relief of material substrates. The curing assembly includes a first exposure chamber configured to expose the material substrate to UV radiation, and a second exposure chamber configured to expose the material substrate to Gamma radiation. In some embodiments, a mixing apparatus may mix nano-filler particles into the material substrate prior to exposure to Gamma radiation. The cure assembly may also include a control system for determining exposure dosages and exposure times based at least in part, on the material properties of the material substrate.
Claims20
A curing assembly comprising:
- a first exposure chamber configured to:
- receive a composite article that includes a first substrate layer, a second substrate layer, and at least one material substrate layer that is configured to be positioned between the first substrate layer and the second substrate layer;
- identify at least one portion of the at least one material substrate layer for further processing;
- and
- expose the at least one portion of the at least one material substrate layer to Gamma radiation such that a high cure state is achieved for the at least one material substrate layer, wherein a dosage level of the Gamma radiation is determined based, at least in part, on at least one composition of the at least one material substrate layer.
A method comprising:
- receiving a composite article that includes a first substrate layer, a second substrate layer, and at least one material substrate layer that is configured to be positioned between the first substrate layer and the second substrate layer;
- identifying at least one portion of the at least one material substrate layer for further processing;
- and
- exposing the at least one portion of the at least one material substrate layer to Gamma radiation such that a high cure state is achieved for the at least one material substrate layer, wherein a dosage level of the Gamma radiation is based, at least in part, on at least one composition of the at least one material substrate layer.
A system comprising:
- a control system;
- and
- a curing assembly comprising:
- a first exposure chamber configured to:
- receive a composite article that includes a first substrate layer, a second substrate layer, and at least one material substrate layer that is configured to be positioned between the first substrate layer and the second substrate layer;
- identify at least one portion of the at least one material substrate layer for further processing;
- and
- expose the at least one portion of the at least one material substrate layer to Gamma radiation such that a high cure state is achieved for the at least one material substrate layer, wherein a dosage level of the Gamma radiation is based, at least in part, on at least one composition of the at least one material substrate layer.
Dependencies are inferred from the claim text.