Method for metal layer formation
AssigneeOrelTech Ltd.
InventorsNatalia ZAMOSHCHIK, Konstantin LIVANOV, Yana SHEYNIN
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Abstract
A method for forming a crystalline metal layer on a three-dimensional (3D) substrate is provided. The method includes applying crystal growth ink to a surface of the 3D substrate, wherein the crystal growth ink includes a metal ionic precursor and a structuring liquid; and exposing the 3D substrate to plasma irradiation from plasma in a vacuum chamber to cause the growing of a crystalline metal layer on the 3D substrate, wherein the exposure is based on a set of predefined exposure parameters.
Claims36
A method for forming a crystalline metal layer on a three-dimensional (3D) substrate, comprising:
- applying crystal growth ink to a surface of the 3D substrate, wherein the crystal growth ink includes a metal ionic precursor and a structuring liquid;
- and
- exposing the 3D substrate to plasma irradiation in vacuum environment to cause the growing of a crystalline metal layer on the 3D substrate, wherein the exposure is based on a set of predefined exposure parameters.
A crystal growth ink comprising:
- a metal ionic precursor;
- and
- a structuring liquid, wherein the crystal growth ink, when applied to a surface of a three-dimensional (3D) substrate and exposed to plasma irradiation in vacuum environment, causes the growth of a crystalline metal layer on the 3D substrate, wherein the exposure is based on a set of predefined exposure parameters.
Dependencies are inferred from the claim text.