Integrated Circuits with Channel-Strain Liner
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsXusheng Wu, Chang-Miao Liu, Huiling Shang
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Abstract
Examples of an integrated circuit with a strain-generating liner and a method for forming the integrated circuit are provided herein. In some examples, an integrated circuit device includes a substrate, a fin extending from the substrate, and a gate disposed on the fin. The gate has a bottom portion disposed towards the fin and a top portion disposed on the bottom portion. A liner is disposed on a side surface of the bottom portion of the gate such that the top portion of the gate is free of the liner. In some such examples, the liner is configured to produce a channel strain.
Claims20
An integrated circuit device comprising:
- a substrate;
- a fin extending from the substrate;
- a gate disposed on the fin and having a bottom portion disposed towards the fin and a top portion disposed on the bottom portion;
- and
- a liner disposed on a side surface of the bottom portion of the gate such that the top portion of the gate is free of the liner.
A device comprising:
- a substrate;
- a pair of source/drain features disposed on the substrate;
- a gate disposed between the pair of source/drain features;
- and
- a liner disposed on each of the pair of source/drain features and extending alongside a first portion of the gate such that a second portion of the gate is free of the liner.
A method comprising:
- receiving a substrate having a placeholder gate disposed thereupon;
- forming a liner extending along a first portion of a side surface of the placeholder gate such that a second portion of the side surface is free of the liner, wherein the liner is configured to produce a channel strain;
- and
- replacing the placeholder gate with a functional gate.
Dependencies are inferred from the claim text.