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US 2020/0006418 A1Published application
Method of manufacturing an imager and imager device
AssigneeInfineon Technologies AG
InventorsDirk Meinhold, Emanuele Bruno Bodini, Felix Braun, Hermann Gruber, Uwe Hoeckele, Dirk Offenberg, Klemens Pruegl, Ines Uhlig
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Abstract
Techniques are discloses regarding methods of manufacturing an imager as well as an imager device.
Claims20
A method of manufacturing a depth imager, comprising:
- providing a substrate having a light-sensitive area;
- forming on the substrate a metal layer stack;
- and
- depositing a passivation layer onto the metal layer stack, the passivation layer extending at least in an area over the light-sensitive area,
- wherein the passivation layer has a matched reduced thickness in the light-sensitive area to provide anti-reflective behavior with respect to the light-sensitive area.
2 more elements
A method of manufacturing a Time Of Flight (TOF) depth imager, comprising:
- providing a substrate having a photo-conversion region;
- forming a metal layer stack on a front side of the substrate;
- providing an optical microlens that focuses light towards the photo-conversion region;
- and
- mounting the substrate having the photo-conversion region onto a separate external glass substrate, the external glass substrate working in conjunction with a concave reflection structure to reflect non-absorbed light back to the photo-conversion region.
2 more elements
The method of 8, further comprising:
- forming a convex part within the concave reflection structure, the convex part providing a focusing effect for the reflected non-absorbed light.
A method of manufacturing a depth imager, comprising:
- providing a substrate having a light-sensitive area;
- forming on the substrate a metal layer stack comprising a plurality of metal layers;
- depositing a first passivation layer on the metal stack layer;
- removing at least a part of the metal layer stack and the first passivation layer in an area over the light-sensitive area;
- and
- depositing a second passivation layer onto the first passivation layer and onto the area that is over the light-sensitive area,
- wherein the second passivation layer has a matched reduced thickness in the area over light-sensitive area to provide anti-reflective behavior with respect to the light-sensitive area.
4 more elements
Dependencies are inferred from the claim text.