Multiple fin height integrated circuit

A method comprising:

• identifying a plurality of fin-containing functional areas of an integrated circuit;
• generating a performance curve for each of the plurality of fin-containing functional areas over a series of operating voltages for a series of candidate fin heights;
• selecting a fin height from the series of candidate fin heights for each of the plurality of fin-containing functional areas, the selected fin height corresponding to a selected value of a performance characteristic of each of the plurality of fin-containing functional areas;
• and
• modifying at least one fin-containing functional area of the plurality of fin-containing functional areas based on the corresponding selected fin height to make a modified integrated circuit.

An integrated circuit, comprising:

• a substrate;
• a first fin-containing area on the substrate, wherein a bottom-most surface of the first fin-containing area is a first distance from a top surface of the substrate, and each fin of the first fin-containing area has a first fin height;
• a second fin-containing area on the substrate, wherein a bottom-most surface of the second fin-containing area is the first distance from the top surface of the substrate, and each fin of the second fin-containing area has a second fin height different from the first fin height;
• and
• a third fin-containing area on the substrate, wherein a bottom-most surface of the third fin-containing area is the first distance from the top surface of the substrate, and each fine of the third fin-containing area has a third fin height different from the first fin height and the second fin height;
• wherein at least one of the first fin height, the second fin height, or the third fin height corresponds to a selected fin height from a trend line of a performance curve.