Micro-electronic package with barrier structure
AssigneeIntel Corporation
InventorsWilliam WARREN, Taylor GAINES, Frederick ATADANA, Edvin CETEGEN, Vipul MEHTA, Hsin-Yu LI, Yuying WEI, Yang GUO, Ren ZHANG
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AssigneeIntel Corporation
InventorsWilliam WARREN, Taylor GAINES, Frederick ATADANA, Edvin CETEGEN, Vipul MEHTA, Hsin-Yu LI, Yuying WEI, Yang GUO, Ren ZHANG
Estimating the term…
A structure including a barrier is described. In embodiments, a micro-electronic component may have a first face and a second face, wherein the second face includes interconnect structures and is opposite the first face. A fill material, such as a capillary underfill material (CUF), may fill a gap between the micro-electronic component and the substrate and substantially surround the interconnect structures. In embodiments, a barrier structure may be located on the surface of the substrate and along a perimeter or outside perimeter of the micro-electronic component, wherein a height of the barrier structure exceeds a height of the fill material in at least a portion of an open region of the substrate to confine the fill material to an area bordered by the barrier structure.
An apparatus, comprising:
A method comprising:
A system, comprising:
Dependencies are inferred from the claim text.