Back to results
US 2020/0006162 A1Published application
Methods and apparatuses for effluent monitoring for brush conditioning
AssigneeIllinois Tool Works Inc.
InventorsBradley Scott Withers, Corey Alan Hughes, Erik Scott Nelson, Steven Kenneth Christie, Brent Allan Best
Life of this patent
Estimating the term…
Abstract
Provided is a disclosure for embodiments that perform effluent monitoring for brush conditioning, where the monitored data may be fed back for use in the conditioning.
Claims20
A system for monitoring contamination level of effluent of an offline brush conditioning system, the system comprising:
- a first reservoir configured to collect a first effluent from a first portion of a brush in the offline brush conditioning system;
- a second reservoir configured to collect a second effluent from a second portion of the brush, wherein the second portion is different from the first portion, and the first and second effluents are from a fluid used to condition a brush configured to clean a surface of a semiconductor wafer;
- and
- an effluent contamination monitor configured to monitor a first and a second contamination levels of the first effluent and the second effluent, respectively.
1 more element
A method for monitoring contamination level of effluent of an offline brush conditioning system, the method comprising:
- collecting a first effluent from a first portion of a brush in the offline brush conditioning system in a first reservoir;
- collecting a second effluent from a second portion of the brush in a second reservoir, wherein the second portion is different from the first portion, and the first and second effluents are from a fluid used to condition a brush configured to clean a surface of a semiconductor wafer;
- and
- determining, with an effluent contamination monitor, a first and second contamination levels of the first effluent and the second effluent, respectively.
1 more element
Dependencies are inferred from the claim text.