Euv radiation source apparatus for lithography
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYu-Chih CHEN, Po-Chung CHENG, Li-Jui CHEN, Shang-Chieh CHIEN, Sheng-Kang YU, Wei-Chun YEN
Life of this patent
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Abstract
An EUV collector mirror for an extreme ultra violet (EUV) radiation source apparatus includes an EUV collector mirror body on which a reflective layer as a reflective surface is disposed, a heater attached to or embedded in the EUV collector mirror body and a drain structure to drain melted metal from the reflective surface of the EUV collector mirror body to a back side of the EUV collector mirror body.
Claims20
An EUV collector mirror for an extreme ultra violet (EUV) radiation source apparatus, comprising:
- an EUV collector mirror body on which a reflective layer as a reflective surface is disposed;
- a heater attached to or embedded in the EUV collector mirror body;
- and
- a drain structure to drain melted metal from the reflective surface of the EUV collector mirror body to a back side of the EUV collector mirror body.
An extreme ultra violet (EUV) radiation source apparatus, comprising:
- an EUV collector mirror;
- a target droplet generator for generating a tin (Sn) droplet;
- a rotatable debris collection mechanism;
- and
- a chamber enclosing at least the EUV collector mirror and the rotatable debris collection mechanism, wherein:
- the EUV collector mirror includes:
- an EUV collector mirror body on which a reflective layer as a reflective surface is disposed;
- a heater attached to or embedded in the EUV collector mirror body;
- and
- a drain structure to drain melted metal from the reflective surface of the EUV collector mirror body to a back side of the EUV collector mirror body.
An extreme ultra violet (EUV) radiation source apparatus, comprising:
- an EUV collector mirror;
- a target droplet generator for generating a tin (Sn) droplet;
- a rotatable debris collection mechanism;
- a chamber enclosing at least the EUV collector mirror and the rotatable debris collection mechanism;
- and
- a metal reuse system, wherein:
- the EUV collector mirror includes:
- an EUV collector mirror body on which a reflective layer as a reflective surface is disposed;
- a heater attached to or embedded in the EUV collector mirror body;
- and
- a drain structure to drain melted metal from the reflective surface of the EUV collector mirror body to a back side of the EUV collector mirror body,
- wherein melted metal drained from the drain structure is directed to the metal reuse system and further provided to the target droplet generator.
Dependencies are inferred from the claim text.