Photosensitive resin composition and cured film comprising the same

A photosensitive resin composition comprising:

• a poly(imide-benzoxazine) block copolymer comprising one or more repeat units selected from the group consisting of a repeat unit represented by the following Chemical Formula 1 and a repeat unit represented by the following Chemical Formula 2;
• and
• a photo-curable multifunctional acrylic compound:
• in Chemical Formulas 1 and 2,
• Y1 is a C6-20 tetravalent aliphatic cyclic group;
• a C6-20 tetravalent aromatic cyclic group;
• or a C4-20 tetravalent heteroaromatic cyclic group comprising one or more heteroatoms selected from the group consisting of N, O, and S;
• the tetravalent aliphatic cyclic group, tetravalent aromatic cyclic group, or tetravalent heteroaromatic cyclic group is unsubstituted or substituted with at least one of —OH, —F, —Cl, —Br, —I, —CF3, —CCl3, —CBr3, —Cl3, —NO2, —CN, —COCH3, CH3COO—, and —CO2C2H5;
• the aliphatic cyclic group, aromatic cyclic group, or heteroaromatic cyclic group may exist alone, two or more rings may be conjugated to form a condensed ring, or two or more rings may be linked by a chemical bond through —O—, —S—, —C(═O)—, —CH(OH)—, —S(═O)2—, —Si(CH3)2—, —(CH2)p— (wherein 1≤p≤10), —(CF2)q— (wherein 1≤q≤10), —C(CH3)2—, —C(CF3)2—, or —C(═O)NH—,
• Y2 includes a C6-20 divalent aliphatic cyclic group or a C6-20 divalent aromatic cyclic group;
• the divalent aliphatic or aromatic cyclic group may be unsubstituted or substituted with at least one of —OH, —F, —Cl, —Br, —I, —CF3, —CCl3, —CBr3, —CI3, —NO2, —CN, —COCH3, CH3COO—, and —CO2C2H5;
• the divalent aliphatic or aromatic cyclic group may exist alone, two or more rings may be conjugated to form a condensed ring, or two or more rings may be linked by a chemical bond through —O—, —S—, —C(═O)—, —CH(OH)—, —S(═O)2—, —Si(CH3)2—, —(CH2)p— (wherein 1≤p≤10), —(CF2)q— (wherein 1≤q≤10), —C(CH3)2—, —C(CF3)2—, or —C(═O)NH—,
• R1's are each independently a hydrogen atom, 2-hydroxybenzyl, 3-hydroxybenzyl, or 4-hydroxybenzyl,
• A1 and A2 are each independently a chemical bond;
• a C6-20 divalent aliphatic cyclic group;
• a C6-20 divalent aromatic cyclic group;
• or a C4-20 tetravalent heteroaromatic cyclic group comprising one or more heteroatoms selected from the group consisting of N, O, and S,
• X1 and X2 are each independently a group represented by the following Chemical Formula 3a or 3b:
• the mark
• indicates a part where the group represented by Chemical Formula 3a or 3b is linked to an adjacent atom in Chemical Formula 1, and
• m and n are each independently a number of 5 to 10,000.