Radiation-sensitive composition and pattern-forming method
AssigneeJsr Corporation
InventorsHisashi NAKAGAWA, Shinya MINEGISHI, Motohiro SHIRATANI
Life of this patent
Estimating the term…
Abstract
A radiation-sensitive composition contains: a compound that includes a metal and an oxygen atom, the metal and the oxygen atom being bonded by a covalent bond; and a solvent composition. The metal is a metal of an element belonging to any one of period 4 to period 7 of group 3 to group 15 in periodic table. The solvent contains: a first solvent having a viscosity at 20° C. of no greater than 10 mPa·s and a vapor pressure at 20° C. of no greater than 5 kPa; and a second solvent having a van der Waals volume of no greater than 150 Å3, and being different from the first solvent. The second solvent is: water; a monovalent alcohol represented by R1—OH; R2—COOH; or a combination thereof.
Claims9
A radiation-sensitive composition comprising:
- a compound comprising a metal and an oxygen atom, the metal and the oxygen atom being bonded by a covalent bond;
- and
- a solvent composition,
- wherein
- the metal is a metal of an element belonging to any one of period 4 to period 7 of group 3 to group 15 in periodic table, and
- the solvent composition comprises:
- a first solvent having a viscosity at 20° C. of no greater than 10 mPa·s and a vapor pressure at 20° C. of no greater than 5 kPa;
- and
- a second solvent having a van der Waals volume of no greater than 150 Å3, and being different from the first solvent,
- the second solvent being:
- water;
- a monovalent alcohol represented by R1—OH;
- R2—COOH;
- or a combination thereof, wherein R1 represents a monovalent organic group having 1 to 4 carbon atoms, and R2 represents a monovalent organic group having 1 to 30 carbon atoms.
Dependencies are inferred from the claim text.