Resist composition and method of forming resist pattern
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsJunichi TSUCHIYA, Masafumi FUJISAKI
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Abstract
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid includes a base component which exhibits changed solubility in a developing solution under action of acid, and a compound represented by general formula (D0-1) below, in which Ya01 represents an arylene group, an alkylene group, an alkenylene group or a divalent alicyclic group, provided that the divalent alicyclic group may contain a hetero atom in the alicyclic structure; R01 represents a linear or branched alkyl group. n01 represents 0 or 1.
Claims13
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition comprising:
- a base component (A) which exhibits changed solubility in a developing solution under action of acid;
- and
- a compound (D0) represented by general formula (D0-1) shown below:
- wherein Ya01 represents an arylene group, an alkylene group, an alkenylene group or a divalent alicyclic group;
- provided that the divalent alicyclic group may contain a hetero atom in the alicyclic structure, and R01 represents a linear or branched alkyl group;
- and n01 represents 0 or 1.
Dependencies are inferred from the claim text.