Resist composition and method of forming resist pattern
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsJunichi TSUCHIYA, Masafumi FUJISAKI
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Abstract
A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid, and an amine compound represented by general formula (d0), and a carboxylic acid compound represented by general formula (e0), or a salt thereof, wherein Rd01, Rd02 and Rd03 each independently represents an aliphatic hydrocarbon group; Re01 represents an aliphatic hydrocarbon group having a fluorine atom; Ye01 represents a divalent linking group or a single bond.
Claims17
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition comprising:
- a base component (A) which exhibits changed solubility in a developing solution under action of acid;
- and
- a combination of an amine compound (D0) represented by general formula (d0) shown below and a carboxylic acid compound (E0) represented by general formula (e0) shown below, or a salt of the amine compound (D0) and the carboxylic acid compound (E0),
- wherein Rd01, Rd02, and Rd03 each independently represents an aliphatic hydrocarbon group which may have a substituent;
- provided that at least two of Rd01, Rd02 and Rd03 may be mutually bonded to form a ring;
- Re01 represents an aliphatic hydrocarbon group having a fluorine atom;
- and Ye01 represents a divalent linking group or a single bond.
Dependencies are inferred from the claim text.