X-ray analysis device and method for optical axis alignment thereof
AssigneeRigaku Corporation
InventorsSHINTARO KOBAYASHI, KATSUHIKO INABA, TORU MITSUNAGA
Life of this patent
Estimating the term…
Loading patent…
AssigneeRigaku Corporation
InventorsSHINTARO KOBAYASHI, KATSUHIKO INABA, TORU MITSUNAGA
Estimating the term…
To provide an X-ray analysis device and a method for optical axis alignment thereof by which measurement time is shortened and measurement cost may be reduced without optical axis alignment at each measurement using an analyzer. The X-ray analysis device includes a sample stage for supporting a sample, an N-dimensional detector, and an analyzer including analyzer crystals. A detection surface of the N-dimensional detector has first and second detection areas, a plurality of optical paths includes a first optical path that directly reaches the first detection area and a second optical path that reaches via the analyzer crystals, and the N-dimensional detector performs a measurement of the first optical path by X-ray detection of the first detection area, and performs a measurement of the second optical path by X-ray detection of the second detection area.
An X-ray analysis device comprising:
A method for optical axis alignment of an X-ray analysis device including
Dependencies are inferred from the claim text.