Back to results
US 2020/0002808 A1Published application
Polysilicon manufacturing apparatus
AssigneeHanwha Chemical Corporation
InventorsHee Dong LEE, Ji Ho KIM, Sung Eun PARK, Hyo Jin JEON
Life of this patent
Estimating the term…
Abstract
A polysilicon manufacturing apparatus according to an exemplary embodiment of the present invention includes: a reactor in which a reactive gas is introduced to perform a polysilicon manufacturing process by a chemical vapor deposition (CVD) method; and a slit-type nozzle installed at the reactor and spraying a gas inside the reactor to prevent absorption of silicon particles during a process.
Claims13
A polysilicon manufacturing apparatus comprising:
- a reactor in which a reactive gas is introduced to perform a polysilicon manufacturing process by a chemical vapor deposition (CVD) method;
- and
- a slit-type nozzle installed at the reactor and spraying a gas inside the reactor to prevent absorption of silicon particles during a process.
Dependencies are inferred from the claim text.