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US 2020/0002806 A1Published application
Film forming apparatus and film forming method using the same
AssigneeCanon Kabushiki Kaisha
InventorsKazuya Demura, Takamasa Horie, Hiroyuki Kobayashi
Life of this patent
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Abstract
A film forming apparatus includes a base material support mechanism configured to rotate a base material supported by the base material support mechanism about a first axis, and a first cathode portion on which a target in a cylindrical shape containing a film forming material is mounted and configured to rotate the target about a second axis, in a chamber. The second axis is disposed at a position skewed with respect to the first axis.
Claims12
A film forming apparatus comprising:
- a base material support mechanism configured to rotate a base material supported by the base material support mechanism about a first rotation axis;
- a first cathode portion configured to rotate a target in a first cylindrical shape about a second rotation axis;
- and
- a second cathode portion configured to rotate a target in a second cylindrical shape about a third rotation axis,
- wherein
- the second rotation axis and the third rotation axis are disposed at positions skewed with respect to the first rotation axis,
- a relation of Ma<Mb is satisfied, where Ma is a distance between the second rotation axis and a base material support surface of the base material support mechanism in a direction in which the first rotation axis extends and Mb is a distance between the third rotation axis and the base material support surface of the base material support mechanism in the direction in which the first rotation axis extends, and
- a relation of La>Lb is satisfied, where La is a distance between the first rotation axis and the second rotation axis when viewed in the direction in which the first rotation axis extends and Lb is a distance between the first rotation axis and the third rotation axis when viewed in the direction in which the first rotation axis extends.
5 more elements
A method of manufacturing a lens, the method comprising:
- preparing a base material;
- mounting the base material on a base material support mechanism and rotating the base material about a first rotation axis;
- rotating a first cathode portion about a second rotation axis disposed at a position skewed with respect to the first rotation axis, and rotating a second cathode portion about a third rotation axis parallel to the second rotation axis;
- forming a film made of a material of the first target and a material of the second target on the base material by applying voltage to the first cathode portion and the second cathode portion,
- wherein
- a relation of Ma<Mb is satisfied, where Ma is a distance between the second rotation axis and a base material support surface of the base material support mechanism in a direction in which the first rotation axis extends and Mb is a distance between the third rotation axis and the base material support surface of the base material support mechanism in the direction in which the first rotation axis extends, and
- a relation of La>Lb is satisfied, where La is a distance between the first rotation axis and the second rotation axis when viewed in the direction in which the first rotation axis extends and Lb is a distance between the first rotation axis and the third rotation axis when viewed in the direction in which the first rotation axis extends.
4 more elements
Dependencies are inferred from the claim text.