Device for Pulsed Laser Deposition and a Substrate with a Substrate Surface for Reduction of Particles on the Substrate

A device for pulsed laser deposition and a substrate with a substrate surface, which device comprises:

• a substrate holder for holding the substrate;
• a target arranged facing the substrate surface of the substrate;
• a velocity filter arranged between the substrate and the target, which velocity filter comprises a rotating body with at least one filter passage opening;
• a pulsed laser directed onto the target at a target spot for generating a plasma plume of target material, wherein the surface of the target at the target spot faces the substrate surface;
• and
• a plasma hole plate arranged between the target and the substrate, which plasma hole plate has a plasma passage opening, wherein the plasma passage opening is divided in an upstream section and a downstream section by a dividing plane, which is perpendicular to the direction of rotation of the velocity filter, wherein the target spot coincides with the dividing plane, and wherein the surface area of the upstream section is larger than the surface area of the downstream section at least at the moment of generation of a plasma plume by the pulsed laser.