Method for producing transparent optical film and method for producing transparent multilayer film

A method for producing a transparent optical film including a silver alloy layer, the method comprising:

• a film formation step of forming a silver layer and a high standard electrode potential metal layer so as to be laminated on a substrate, the film formation step including a silver deposition step of forming the silver layer, at a thickness of 6 nm or less, by vacuum deposition, and a high standard electrode potential metal deposition step of forming the high standard electrode potential metal layer, which is a layer formed of a high standard electrode potential metal that is a metal having a higher standard electrode potential than that of silver, by vacuum deposition;
• and
• an alloying step of forming the silver alloy layer by diffusing the high standard electrode potential metal within the silver layer by performing a heating treatment at a temperature of 50° C. or higher and 400° C. or lower, wherein:
• the film formation step includes an anchor metal deposition step of forming an anchor metal layer, formed of an anchor metal having a lower surface energy than silver at a side closer to the substrate than the silver layer, by vacuum deposition, and
• the high standard electrode potential metal deposition step, the anchor metal deposition step, and the silver deposition step are performed in this order.

A method for producing a transparent optical film including a silver alloy layer, the method comprising:

• a film formation step of forming a silver layer and a high standard electrode potential metal layer so as to be laminated on a substrate, the film formation step including a silver deposition step of forming the silver layer, at a thickness of 6 nm or less, by vacuum deposition, and a high standard electrode potential metal deposition step of forming the high standard electrode potential metal layer, which is a layer formed of a high standard electrode potential metal that is a metal having a higher standard electrode potential than that of silver, by vacuum deposition;
• and
• an alloying step of forming the silver alloy layer by diffusing the high standard electrode potential metal within the silver layer by performing a heating treatment at a temperature of 50° C. or higher and 400° C. or lower, wherein:
• the film formation step includes an anchor metal deposition step of forming an anchor metal layer, formed of an anchor metal having a lower surface energy than silver at a side closer to the substrate than the silver layer, by vacuum deposition, and
• an oxidation step of oxidizing at least a part of the anchor metal by performing a heating treatment under an oxygen-containing atmosphere is performed after the anchor metal layer and the silver layer are laminated on the substrate in this order by performing the anchor metal deposition step and the silver deposition step in this order, and
• after the oxidation step, the high standard electrode potential metal deposition step is performed.