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US 2019/0378716 A1Published application
Infrared optical sensor and manufacturing method thereof
AssigneeElectronics and Telecommunications Research Institute
InventorsBok Ki MIN, Choon Gi CHOI
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Abstract
Provided is an infrared optical sensor including a substrate, a channel layer on the substrate, optical absorption structures dispersed and disposed on the channel layer, and electrodes disposed on the substrate, and disposed on both sides of the channel layer, wherein the channel layer and the optical absorption structures include transition metal dichalcogenides.
Claims15
An infrared optical sensor comprising:
- a substrate;
- a channel layer on the substrate;
- optical absorption structures dispersed and disposed on the channel layer;
- and
- electrodes disposed on the substrate, and disposed on both sides of the channel layer,
- wherein the channel layer and the optical absorption structures comprise transition metal dichalcogenides.
3 more elements
A manufacturing method of an infrared optical sensor comprising:
- forming a channel layer on a substrate;
- growing optical absorption structures on a top surface of the channel layer;
- and
- forming electrodes on both sides of the channel layer on the substrate,
- wherein the forming of the channel layer and the growing of the optical absorption structures comprise:
- providing a transition metal element source and a chalcogenide element source in one side of the substrate;
- providing vapor of the transition metal element source and vapor of the chalcogenide element source on the substrate;
- and
- applying heat onto the substrate.
6 more elements
Dependencies are inferred from the claim text.