# US 2019/0378699 A1 · Methods and apparatus for magnetron assemblies in semiconductor process chambers > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2019/0378699 A1 - Document ID: US20190378699A1 - Status: Published application - Kind: A1 - Application number: 16/425,189 - Filed: 2019-05-29 - Published: 2019-12-12 - Earliest claimed: 2018-06-07 - Assignees: Applied Materials, Inc. - Applicants: Applied Materials, Inc. - Inventors: RONGJUN WANG; XIAODONG WANG; WEI WANG - Web page: https://patentgrep.com/patent/US20190378699A1 ## CPC - H01J 37/3405: {Magnetron sputtering} - H01J 37/3441: {Dark space shields} - H01J 37/3452: {Magnet distribution} - H10P 14/22: using physical deposition, e.g. vacuum deposition or sputtering - H10P 14/6329: {using physical ablation of a target, e.g. physical vapour deposition or pulsed laser deposition} - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract An apparatus for processing semiconductors that comprises a process chamber with multiple cathodes disposed in a top adapter assembly. The multiple cathodes having magnetron assemblies that comprise a shunt plate for supporting the magnetron assembly, a loop magnetic pole assembly coupled to the shunt plate with a loop magnetic pole, a linear magnetic pole, and a center magnetic pole, the linear magnetic pole extending from the loop magnetic pole into the center magnetic pole which is located at a center of the magnetron assembly, and an open loop magnetic pole arc assembly coupled to the shunt plate surrounding at least a portion of the center magnetic pole without intersecting with the linear magnetic pole. The magnetron assemblies are orientated such that an opening of the open loop magnetic pole arc assembly is oriented towards an outer wall of the shield. ## Claims ### Claim 1 A magnetron assembly, comprising: a shunt plate for supporting the magnetron assembly; a loop magnetic pole assembly coupled to the shunt plate with a loop magnetic pole, a linear magnetic pole, and a center magnetic pole, the linear magnetic pole extending from the loop magnetic pole into the center magnetic pole which is located at a center of the magnetron assembly; and an open loop magnetic pole arc assembly coupled to the shunt plate surrounding at least a portion of the center magnetic pole without intersecting with the linear magnetic pole. ### Claim 2 (depends on 1) The magnetron assembly of claim 1, wherein the open loop magnetic pole arc assembly has an arc length of approximately 180 degrees to approximately 350 degrees. ### Claim 3 (depends on 1) The magnetron assembly of claim 1 is in a cathode of a process chamber. ### Claim 4 (depends on 3) The magnetron assembly of claim 3, wherein the cathode is at least one of a plurality of cathodes in a multi-cathode process chamber. ### Claim 5 (depends on 1) The magnetron assembly of claim 1 installed in a process chamber with an open portion of the open loop magnetic pole arc assembly in proximity of an outer wall of a shield within the process chamber. ### Claim 6 (depends on 1) The magnetron assembly of claim 1, wherein the loop magnetic pole assembly has an even distribution of magnets. ### Claim 7 (depends on 1) The magnetron assembly of claim 1, wherein the open loop magnetic pole arc assembly has an even distribution of magnets. ### Claim 8 (depends on 1) The magnetron assembly of claim 1, wherein at least a portion of the open loop magnetic pole arc assembly or the loop magnetic pole assembly is made of a ferromagnetic material. ### Claim 9 (depends on 1) The magnetron assembly of claim 1, wherein a first width of the open loop magnetic pole arc assembly and a second width of the loop magnetic pole are approximately equal. ### Claim 10 (depends on 1) The magnetron assembly of claim 1, wherein a first distance between the loop magnetic pole and the open loop magnetic pole arc assembly and a second distance between the open loop magnetic pole arc assembly and the center magnetic pole are approximately equal. ### Claim 11 (depends on 1) The magnetron assembly of claim 1, wherein a third distance between a first end of the open loop magnetic pole arc assembly and the linear magnetic pole and a fourth distance from a second end of the open loop magnetic pole arc assembly and the linear magnetic pole are approximately equal. ### Claim 12 (depends on 1) The magnetron assembly of claim 1, wherein the loop magnetic pole has a first constant radius about a center point of the center magnetic pole and the open loop magnetic pole arc assembly has a second constant radius about a center point of the center magnetic pole, the first constant radius greater than the second constant radius. ### Claim 13 (depends on 1) The magnetron assembly of claim 1, wherein a first distance between the loop magnetic pole and the open loop magnetic pole arc assembly and a second distance between the open loop magnetic pole arc assembly and the center magnetic pole are different. ### Claim 14 An apparatus for processing semiconductors, comprising: a process chamber with a chamber body and a top adapter assembly that form an internal volume; and at least one cathode disposed in the top adapter assembly, the at least one cathode having a magnetron assembly configured to produce a magnetic field with a reduced magnetic field strength for a portion of the magnetic field that is in close proximity to a wall of the internal volume. ### Claim 15 (depends on 14) The apparatus of claim 14, the magnetron assembly comprising: a shunt plate for supporting the magnetron assembly; a loop magnetic pole assembly coupled to the shunt plate with a loop magnetic pole, a linear magnetic pole, and a center magnetic pole, the linear magnetic pole extending from the loop magnetic pole into the center magnetic pole which is located at a center of the magnetron assembly; and an open loop magnetic pole arc assembly coupled to the shunt plate surrounding at least a portion of the center magnetic pole without intersecting with the linear magnetic pole, wherein the magnetron assembly is configured to be orientated such that an opening of the open loop magnetic pole arc assembly is oriented towards the wall of the internal volume. ### Claim 16 (depends on 15) The apparatus of claim 15, wherein the open loop magnetic pole arc assembly has an arc length of approximately 180 degrees to approximately 350 degrees. ### Claim 17 (depends on 15) The apparatus of claim 15, wherein a first width of the open loop magnetic pole arc assembly and a second width of the loop magnetic pole are approximately equal. ### Claim 18 (depends on 15) The apparatus of claim 15, wherein a first distance between the loop magnetic pole and the open loop magnetic pole arc assembly and a second distance between the open loop magnetic pole arc assembly and the center magnetic pole are different. ### Claim 19 A cathode assembly, comprising: a magnetron assembly configured to produce a magnetic field with a reduced magnetic field strength for a portion of the magnetic field and configured to be oriented such that the portion of the magnetic field with the reduced magnetic field strength is in close proximity to a wall of an internal volume of a process chamber when installed. ### Claim 20 (depends on 19) The cathode assembly of claim 19, wherein the magnetron assembly comprising: a shunt plate for supporting the magnetron assembly; a loop magnetic pole assembly coupled to the shunt plate with a loop magnetic pole, a linear magnetic pole, and a center magnetic pole, the linear magnetic pole extending from the loop magnetic pole into the center magnetic pole which is located at a center of the magnetron assembly; and an open loop magnetic pole arc assembly coupled to the shunt plate surrounding at least a portion of the center magnetic pole without intersecting with the linear magnetic pole, wherein the cathode assembly is configured to be installed in a process chamber such that the magnetron assembly is orientated with an opening of the open loop magnetic pole arc assembly towards an outer wall of the process chamber.