# US 2019/0378693 A1 · Plasma processing apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2019/0378693 A1 - Document ID: US20190378693A1 - Status: Published application - Kind: A1 - Application number: 16/549,408 - Filed: 2019-08-23 - Published: 2019-12-12 - Earliest claimed: 2016-06-17 - Assignees: Samsung Electronics Co., Ltd. - Applicants: Samsung Electronics Co., Ltd. - Inventors: Hak Young Kim; Jung Pyo Hong; Jong Woo Sun; Doug Yong Sung; Yong Ho Lim; Yun Kwang Jeon; Hwa Jun Jung - Web page: https://patentgrep.com/patent/US20190378693A1 ## CPC - H01J 37/3244: {Gas supply means} - H01J 37/321: {the radio frequency energy being inductively coupled to the plasma} - H01J 37/32119: {Windows} - H01J 37/32449: {Gas control, e.g. control of the gas flow} - H01J 37/32458: {Vessel} - H10P 72/0421: {for drying etching} - H01J 2237/334: Etching - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract A plasma processing apparatus includes a chamber, a window plate disposed in an upper portion of the chamber and having a fastening hole defined therein, an injector having a body part including a plurality of nozzles and configured to be fastened to the fastening hole, and a flange part extending radially from the body part to partially cover a bottom surface of the window plate when the body part is fastened to the fastening hole, and a stopper configured to be fastened to the body part on an upper surface of the window plate to hold the injector in the fastening hole when the body part is fastened to the fastening hole. ## Claims ### Claim 1 A plasma processing apparatus comprising: a chamber; a window plate disposed in an upper portion of the chamber and having a hole; and an injector configured to be disposed in the hole, the injector having a plurality of distribution nozzles for distributing a process gas, and a plurality of injection nozzles connected to the plurality of distribution nozzles and inclined along a circumference of the injector toward a lower surface of the injector. ### Claim 2 (depends on 1) The plasma processing apparatus of claim 1, wherein the plurality of injection nozzles are inclined in the same direction with respect to a central axis of the injector, respectively. ### Claim 3 (depends on 2) The plasma processing apparatus of claim 2, wherein the same direction is a counterclockwise direction. ### Claim 4 (depends on 1) The plasma processing apparatus of claim 1, wherein the injector comprises a first body in which the plurality of distribution nozzles are disposed, and a second body having an accommodating groove to which the first body is accommodated and in which the plurality of injection nozzles are disposed. ### Claim 5 (depends on 4) The plasma processing apparatus of claim 4, wherein the accommodating groove comprises a first accommodating groove disposed in a central portion of the first body, and a second accommodating groove disposed around the first accommodating groove, and wherein a bottom surface of the first accommodating groove is located at a lower vertical level than a bottom surface of the second accommodating groove. ### Claim 6 (depends on 5) The plasma processing apparatus of claim 5, wherein a lower surface of the first body is spaced apart from the bottom surface of the first accommodating groove and from the bottom surface of the second accommodating groove by a predetermined distance. ### Claim 7 (depends on 5) The plasma processing apparatus of claim 5, wherein the first accommodating groove has a cylindrical structure, and the second accommodating groove has a ring-shaped structure disposed around the first accommodating groove. ### Claim 8 (depends on 5) The plasma processing apparatus of claim 5, wherein the plurality of injection nozzles extend downwardly from the second accommodating groove to connect to the lower surface of the injector. ### Claim 9 (depends on 5) The plasma processing apparatus of claim 5, wherein the plurality of distribution nozzles comprise first distribution nozzles disposed in a center portion of the first body and located inside the first accommodating groove, and second distribution nozzles disposed around the first distribution nozzles and located inside the second accommodating groove. ### Claim 10 (depends on 9) The plasma processing apparatus of claim 9, wherein the second distribution nozzles are connected to the injection nozzles in the second accommodating groove. ### Claim 11 (depends on 4) The plasma processing apparatus of claim 4, wherein, when the first body of the injector is disposed in the accommodating groove, the injector has a space defined between the first body and the second body for accommodating the process gas between the first body and the second body. ### Claim 12 (depends on 4) The plasma processing apparatus of claim 4, wherein the second body has a flange part extending radially outwardly to partially cover a bottom surface of the window plate. ### Claim 13 A plasma processing apparatus comprising: a chamber; a window plate disposed in an upper portion of the chamber and having a hole; a support member disposed in a lower portion of the chamber; an antenna disposed above the window plate; a power source for supplying power to the antenna; and an injector having a body part configured to be fastened to the hole, the body part having a plurality of nozzles and a planar lower surface, wherein the plurality of nozzles comprise a plurality of first nozzles disposed radially in a lateral direction from a central axis of the body part, and a plurality of second nozzles disposed to be inclined along a circumference of the injector toward a lower surface of the injector and to be at an acute angle to a vertical line parallel to the central axis of the body part. ### Claim 14 (depends on 13) The plasma processing apparatus of claim 13, wherein the plurality of first nozzles extend radially from the central axis to be connected to an outer lateral surface of the body part. ### Claim 15 (depends on 13) The plasma processing apparatus of claim 13, wherein the plurality of second nozzles are spirally disposed along the circumference of the injector toward the lower surface of the injector. ### Claim 16 A plasma processing apparatus comprising: a chamber; a window plate disposed in an upper portion of the chamber and having a hole; and an injector configured to be disposed in the hole, the injector having a body part having a plurality of nozzles including a plurality of distribution nozzles for distributing a process gas, and a plurality of injection nozzles connected to the plurality of distribution nozzles and inclined along a circumference of the injector at an equal distance, wherein the plurality of nozzles comprise a plurality of first nozzles disposed radially in a lateral direction from a central axis of the body part, and a plurality of second nozzles disposed to be inclined downwardly along a circumference of the injector toward a lower surface of the injector and to be at an acute angle to a vertical line parallel to the central axis of the body part. ### Claim 17 (depends on 16) The plasma processing apparatus of claim 16, wherein the body part comprises a first body in which the plurality of distribution nozzles are disposed, and a second body having an accommodating groove to which the first body is accommodated and in which the plurality of injection nozzles are disposed. ### Claim 18 (depends on 17) The plasma processing apparatus of claim 17, wherein the accommodating groove comprises a first accommodating groove disposed in a central portion of the first body, and a second accommodating groove disposed around the first accommodating groove, and wherein a lower surface of the first body is spaced apart from a bottom surface of the first accommodating groove to form a first space, and the lower surface of the first body is spaced apart from a bottom surface of the second accommodating groove to form a second space. ### Claim 19 (depends on 18) The plasma processing apparatus of claim 18, wherein the plurality of injection nozzles are connected to the second space. ### Claim 20 (depends on 18) The plasma processing apparatus of claim 18, wherein the plurality of injection nozzles are connected to the bottom surface of the second accommodating groove.