# US 2019/0378688 A1 · Data processing method, data processing apparatus, and multiple charged-particle beam writing apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2019/0378688 A1 - Document ID: US20190378688A1 - Status: Published application - Kind: A1 - Application number: 16/432,009 - Filed: 2019-06-05 - Published: 2019-12-12 - Earliest claimed: 2018-06-08 - Assignees: NuFlare Technology, Inc. - Applicants: NuFlare Technology, Inc. - Inventors: Kei HASEGAWA; Yoshiaki ONIMARU; Hayato KIMURA - Web page: https://patentgrep.com/patent/US20190378688A1 ## CPC - H01J 37/302: Controlling tubes by external information, e.g. program control (H01J37/304 takes precedence) - H01J 37/045: {Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge} - H01J 37/09: Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields - H01J 37/20: Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support - H01J 37/304: Controlling tubes by information coming from the objects {or from the beam}, e.g. correction signals - H01J 37/3177: {Multi-beam, e.g. fly's eye, comb probe} - H01J 2237/043: Beam blanking - H01J 2237/0453: multiple apertures - H01J 2237/153: Correcting image defects, e.g. stigmators - H01J 2237/202: Movement - H01J 2237/24507: Intensity, dose or other characteristics of particle beams or electromagnetic radiation - H01J 2237/30416: Handling of data - H01J 2237/30455: Correction during exposure - H01J 2237/31764: Dividing into sub-patterns - H01J 2237/31771: using multiple exposure - H01J 2237/31774: Multi-beam - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) ## Abstract In one embodiment, a data processing method is for processing data in a writing apparatus performing multiple writing by using multiple beams. The data is for controlling an irradiation amount for each beam. The method includes generating irradiation amount data for each of a plurality of layers, the irradiation amount data defining an irradiation amount for each of a plurality of irradiation position, and the plurality of layers corresponding to writing paths in multiple writing, performing a correction process on the irradiation amounts defined in the irradiation amount data provided for each layer, calculating a sum of the irradiation amounts for the respective irradiation positions defined in the corrected irradiation amount data, comparing the sums between the plurality of layers, and determining whether or not an error has occurred in the correction process based on the comparison result. ## Claims ### Claim 1 A data processing method for processing data in a writing apparatus performing multiple writing by using multiple beams formed of charged-particle beams, the data being data for controlling an irradiation amount for each beam, the method comprising: generating irradiation amount data for each of a plurality of layers, the irradiation amount data defining an irradiation amount for each of a plurality of irradiation positions, the plurality of irradiation positions being obtained by dividing a writing area of a substrate in a mesh shape virtually, the substrate being a writing target, the plurality of layers corresponding to writing paths in multiple writing; performing a correction process on the irradiation amounts defined in the irradiation amount data provided for each of the plurality of layers; and calculating a sum of the irradiation amounts for the respective irradiation positions, the irradiation amounts being defined in the irradiation amount data after the correction process for each of the plurality of layers, comparing the sums between the plurality of layers, and determining whether or not an error has occurred in the correction process on a basis of the comparison result. ### Claim 2 (depends on 1) The data processing method according to claim 1, wherein the correction process includes a correction process on the irradiation amounts based on a beam current distribution map for the substrate, the substrate being a writing target, and wherein the irradiation amounts before the correction are obtained by performing a current-distribution inverse operation on the irradiation amount data after the correction process on a basis of the beam current distribution, and it is determined whether or not an error has occurred, by comparing, between the plurality of layers, the sums of the obtained irradiation amounts before the correction. ### Claim 3 (depends on 1) The data processing method according to claim 1, wherein the correction process includes a correction process on the irradiation amounts based on a defect list, the defect list listing a defective beam in the multiple beams, and wherein, after the sums of the irradiation amounts are adjusted on a basis of an amount of the correction of the irradiation amounts in the correction process, the sums of the irradiation amounts are compared between the plurality of layers, and it is determined whether or not an error has occurred. ### Claim 4 (depends on 1) The data processing method according to claim 1, wherein the correction process includes a correction process on the irradiation amounts based on a distortion map defining a position shift amount of each beam in the multiple beams, and wherein, after the correction of the irradiation amounts based on the distortion map, the sums of the irradiation amounts are compared between the plurality of layers, and it is determined whether or not an error has occurred. ### Claim 5 (depends on 1) The data processing method according to claim 1, wherein the correction process includes an extraction process of extracting, from the irradiation amount data for each of the plurality of layers, pieces of irradiation amount data for a plurality of stripe areas individually, and wherein, after the extraction process of the pieces of irradiation amount data, the sums of the irradiation amounts are compared between the plurality of layers, and it is determined whether or not an error has occurred. ### Claim 6 (depends on 1) The data processing method according to claim 1, wherein the correction process includes an extraction process of extracting, from the irradiation amount data for each of the plurality of layers, pieces of irradiation amount data for a plurality of stripe areas individually, a correction process on the irradiation amounts based on a distortion map defining a position shift amount for each beam of the multiple beams, a correction process on the irradiation amounts based on a defect list listing a defective beam in the multiple beams, and a correction process on the irradiation amounts based on a beam current distribution map for the substrate, the substrate being a writing target, and wherein, at each of a stage after the extraction process of the pieces of irradiation amount data, a stage after the correction process on the irradiation amounts based on the distortion map, a stage after the correction process on the irradiation amounts based on the defect list, and a stage after the correction process on the irradiation amounts based on the current distribution map, it is determined whether or not the error has occurred. ### Claim 7 (depends on 1) The data processing method according to claim 1, wherein, when a difference in sum between the plurality of layers falls into a given range, it is determined that an error has not occurred. ### Claim 8 A data processing apparatus for processing data in a writing apparatus performing multiple writing by using multiple beams formed of charged-particle beams, the data being data for controlling an irradiation amount for each beam, the apparatus comprising: a generating unit that generates irradiation amount data for each of a plurality of layers, the irradiation amount data defining an irradiation amount for each of a plurality of irradiation positions, the plurality of irradiation positions being obtained by dividing a writing area of a substrate in a mesh shape virtually, the substrate being a writing target, the plurality of layers corresponding to writing paths in multiple writing; a correction unit that performs a correction process on the irradiation amounts defined in the irradiation amount data provided for each of the plurality of layers; and an error detecting unit that calculates a sum of the irradiation amounts for the respective irradiation positions, the irradiation amounts being defined in the irradiation amount data after the correction process for each of the plurality of layers, that compares the sums between the plurality of layers, and that determines whether or not an error has occurred in the correction process on a basis of the comparison result. ### Claim 9 (depends on 8) The data processing apparatus according to claim 8, wherein the correction process includes a correction process on the irradiation amounts based on a beam current distribution map for the substrate, the substrate being a writing target, and wherein the error detecting unit obtains the irradiation amounts before the correction by performing a current-distribution inverse operation on the irradiation amount data after the correction process on a basis of the beam current distribution, and determines whether or not an error has occurred, by comparing, between the plurality of layers, the sums of the obtained irradiation amounts before the correction. ### Claim 10 (depends on 8) The data processing apparatus according to claim 8, wherein the correction process includes a correction process on the irradiation amounts based on a defect list, the defect list listing a defective beam in the multiple beams, and wherein, after adjusting the sums of the irradiation amounts on a basis of an amount of the correction of the irradiation amounts in the correction process, the error detecting unit compares, between the plurality of layers, the sums of the irradiation amounts, and determines whether or not an error has occurred. ### Claim 11 (depends on 8) The data processing apparatus according to claim 8, wherein the correction process includes a correction process on the irradiation amounts based on a distortion map defining a position shift amount of each beam in the multiple beams, and wherein, after the correction of the irradiation amounts based on the distortion map, the error detecting unit compares, between the plurality of layers, the sums of the irradiation amounts, and determines whether or not an error has occurred. ### Claim 12 (depends on 8) The data processing apparatus according to claim 8, wherein the correction process includes an extraction process of extracting, from the irradiation amount data for each of the plurality of layers, pieces of irradiation amount data for a plurality of stripe areas individually, and wherein, after the extraction process of the pieces of irradiation amount data, the error detecting unit compares, between the plurality of layers, the sums of the irradiation amounts, and determines whether or not an error has occurred. ### Claim 13 (depends on 8) The data processing apparatus according to claim 8, wherein the correction process includes an extraction process of extracting, from the irradiation amount data for each of the plurality of layers, pieces of irradiation amount data for a plurality of stripe areas individually, a correction process on the irradiation amounts based on a distortion map defining a position shift amount for each beam of the multiple beams, a correction process on the irradiation amounts based on a defect list listing a defective beam in the multiple beams, and a correction process on the irradiation amounts based on a beam current distribution map for the substrate, the substrate being a writing target, and wherein, at each of a stage after the extraction process of the pieces of irradiation amount data, a stage after the correction process on the irradiation amounts based on the distortion map, a stage after the correction process on the irradiation amounts based on the defect list, and a stage after the correction process on the irradiation amounts based on the current distribution map, the error detecting unit determines whether or not the error has occurred. ### Claim 14 A multiple charged-particle beam writing apparatus comprising: a stage that is movable with a substrate placed thereon, the substrate being a writing target; an emitting unit that emits a charged-particle beam; a shaping aperture plate including a plurality of opening portions, and forming multiple beams by allowing the charged-particle beam to pass through the plurality of opening portions; a blanking plate that has a plurality of blankers performing blanking deflection of the respective beams of the multiple beams; a generating unit that generates irradiation amount data for each of a plurality of layers, the irradiation amount data defining an irradiation amount for each of a plurality of irradiation positions, the plurality of irradiation positions being obtained by dividing a writing area of a substrate in a mesh shape virtually, the substrate being a writing target, the plurality of layers corresponding to writing paths in multiple writing; a correction unit that performs a correction process on the irradiation amounts defined in the irradiation amount data provided for each of the plurality of layers; and an error detecting unit that calculates a sum of the irradiation amounts for the respective irradiation positions, the irradiation amounts being defined in the irradiation amount data after the correction process for each of the plurality of layers, that compares the sums between the plurality of layers, and that determines whether or not an error has occurred in the correction process on a basis of the comparison result; and a data transfer unit that, when it is determined that an error has not occurred, transfers the irradiation amount data after the correction process to the blanking plate. ### Claim 15 (depends on 14) The apparatus according to claim 14, wherein the correction process includes a correction process on the irradiation amounts based on a beam current distribution map for the substrate, the substrate being a writing target, and wherein the error detecting unit obtains the irradiation amounts before the correction by performing a current-distribution inverse operation on the irradiation amount data after the correction process on a basis of the beam current distribution, and determines whether or not an error has occurred, by comparing, between the plurality of layers, the sums of the obtained irradiation amounts before the correction. ### Claim 16 (depends on 14) The apparatus according to claim 14, wherein the correction process includes a correction process on the irradiation amounts based on a defect list, the defect list listing a defective beam in the multiple beams, and wherein, after adjusting the sums of the irradiation amounts on a basis of an amount of the correction of the irradiation amounts in the correction process, the error detecting unit compares, between the plurality of layers, the sums of the irradiation amounts, and determines whether or not an error has occurred. ### Claim 17 (depends on 14) The apparatus according to claim 14, wherein the correction process includes a correction process on the irradiation amounts based on a distortion map defining a position shift amount of each beam in the multiple beams, and wherein, after the correction of the irradiation amounts based on the distortion map, the error detecting unit compares, between the plurality of layers, the sums of the irradiation amounts, and determines whether or not an error has occurred. ### Claim 18 (depends on 14) The apparatus according to claim 14, wherein the correction process includes an extraction process of extracting, from the irradiation amount data for each of the plurality of layers, pieces of irradiation amount data for a plurality of stripe areas individually, and wherein, after the extraction process of the pieces of irradiation amount data, the error detecting unit compares, between the plurality of layers, the sums of the irradiation amounts, and determines whether or not an error has occurred. ### Claim 19 (depends on 14) The apparatus according to claim 14, wherein the correction process includes an extraction process of extracting, from the irradiation amount data for each of the plurality of layers, pieces of irradiation amount data for a plurality of stripe areas individually, a correction process on the irradiation amounts based on a distortion map defining a position shift amount for each beam of the multiple beams, a correction process on the irradiation amounts based on a defect list listing a defective beam in the multiple beams, and a correction process on the irradiation amounts based on a beam current distribution map for the substrate, the substrate being a writing target, and wherein, at each of a stage after the extraction process of the pieces of irradiation amount data, a stage after the correction process on the irradiation amounts based on the distortion map, a stage after the correction process on the irradiation amounts based on the defect list, and a stage after the correction process on the irradiation amounts based on the current distribution map, the error detecting unit determines whether or not the error has occurred.