# US 2019/0377264 A1 · Metrology robustness based on through-wavelength similarity

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- Number: US 2019/0377264 A1
- Document ID: US20190377264A1
- Status: Published application
- Kind: A1
- Application number: 16/549,661
- Filed: 2019-08-23
- Published: 2019-12-12
- Earliest claimed: 2016-05-17
- Assignees: ASML Netherlands B.V.
- Applicants: Asml Netherlands B.V.
- Inventors: Miguel GARCIA GRANDA; Christian Marinus LEEWIS; Frank STAALS
- Web page: https://patentgrep.com/patent/US20190377264A1

## CPC

- G03F 7/70633: {Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching}
- G03F 7/706831: {Recipe selection or optimisation, e.g. select or optimise recipe parameters such as wavelength, polarisation or illumination modes}
- G03F 7/706839: {Modelling, e.g. modelling scattering or solving inverse problems}
- G03F 9/7019: {Calibration}
- G03F 9/7026: {Focusing}
- G03F 9/7046: {Strategy, e.g. mark, sensor or wavelength selection}
- G03F 9/7092: {Signal processing}
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

A method including obtaining a measurement result from a target on a substrate, by using a substrate measurement recipe; determining, by a hardware computer system, a parameter from the measurement result, wherein the parameter characterizes dependence of the measurement result on an optical path length of the target for incident radiation used in the substrate measurement recipe and the determining the parameter includes determining dependence of the measurement result on a relative change of wavelength of the incident radiation; and if the parameter is not within a specified range, adjusting the substrate measurement recipe.

## Claims

### Claim at position 1

-15. (canceled)

### Claim 16

A computer program product comprising a non-transitory computer readable medium having instructions recorded thereon, the instructions, upon execution by a computer system, configured to cause the computer system to at least:
obtain a measurement result from a target on a substrate, by using a substrate measurement recipe;
determine, based on a relationship of an optical path length of the target for incident radiation used in accordance with the substrate measurement recipe to a relative change of wavelength of the incident radiation used in accordance with the substrate measurement recipe, a parameter value from the measurement result; and
based on the parameter value, adjust or select a substrate measurement recipe.

### Claim 17 (depends on 16)

The computer program product of claim 16, wherein the measurement result comprises an overlay error, alignment, focus, critical dimension, or a normalized intensity asymmetry of two diffraction orders from the target.

### Claim 18 (depends on 16)

The computer program product of claim 16, wherein the parameter is a derivative of the measurement result with respect to a relative change of the optical path length.

### Claim 19 (depends on 16)

The computer program product of claim 16, wherein the instructions configured to determine the parameter value are further configured to use measurement results at at least two different wavelengths to determine the parameter value.

### Claim 20 (depends on 16)

The computer program product of claim 16, wherein the parameter is a difference between two sets of measurement results obtained using two substrate measurement recipes with different wavelengths of the incident radiation.

### Claim 21 (depends on 16)

The computer program product of claim 16, wherein the instructions are configured to adjust the substrate measurement recipe and the instructions configured to adjust the substrate measurement recipe are further configured to adjust a parameter of a measurement target structure associated with the substrate measurement recipe.

### Claim 22 (depends on 16)

The computer program product of claim 16, wherein the instructions are configured to adjust the substrate measurement recipe and the instructions configured to adjust the substrate measurement recipe are further configured to adjust a parameter of a measurement using the substrate measurement recipe.

### Claim 23 (depends on 22)

The computer program product of claim 22, wherein the parameter of the measurement comprises polarization or wavelength of the incident measurement radiation.

### Claim 24 (depends on 16)

The computer program product of claim 16, wherein the instructions are further configured to obtain a measurement result from the target by using each of a plurality of substrate measurement recipes, determine a parameter value from each of the measurement results, and select at least one substrate measurement recipe from the plurality of substrate measurement recipes based on the parameter values.

### Claim 25

A computer program product comprising a non-transitory computer readable medium having instructions recorded thereon, the instructions, upon execution by a computer system, configured to cause the computer system to at least:
obtain a measurement result from a target on a substrate, by using a substrate measurement recipe;
determine a parameter value from the measurement result, wherein the parameter characterizes dependence of the measurement result on an optical path length of the target for incident radiation used in accordance with the substrate measurement recipe to obtain the measurement result; and
based on the parameter value, adjust a substrate measurement recipe.

### Claim 26 (depends on 25)

The computer program product of claim 25, wherein the instructions configured to determine the parameter value are further configured to determine dependence of the measurement result on a relative change of wavelength of the incident radiation.

### Claim 27 (depends on 25)

The computer program product of claim 25, wherein the parameter is a derivative of the measurement result with respect to a relative change of the optical path length.

### Claim 28 (depends on 25)

The computer program product of claim 25, wherein the instructions configured to determine the parameter value are further configured to use measurement results at at least two different wavelengths.

### Claim 29 (depends on 25)

The computer program product of claim 25, wherein the parameter is a difference between two sets of measurement results obtained using two substrate measurement recipes with different wavelengths of the incident radiation.

### Claim 30 (depends on 25)

The computer program product of claim 25, wherein the instructions configured to determine the parameter value are further configured to determine the parameter value based on a relationship of an optical path length of the target for incident radiation used in accordance with the substrate measurement recipe to a relative change of wavelength of the incident radiation used in accordance with the substrate measurement recipe.

### Claim 31

A method comprising:
obtaining a measurement result from a target on a substrate, by using a substrate measurement recipe;
determining, by a hardware computer system, a parameter value from the measurement result, wherein the parameter characterizes dependence of the measurement result on an optical path length of the target for incident radiation used in accordance with the substrate measurement recipe to obtain the measurement result; and
based on the parameter value, adjusting a substrate measurement recipe.

### Claim 32 (depends on 30)

The method of claim 30, wherein determining the parameter value comprises determining dependence of the measurement result on a relative change of wavelength of the incident radiation.

### Claim 33 (depends on 30)

The method of claim 30, wherein the parameter is a derivative of the measurement result with respect to a relative change of the optical path length.

### Claim 34 (depends on 30)

The method of claim 30, wherein determining the parameter value comprises using measurement results at at least two different wavelengths.

### Claim 35 (depends on 30)

The method of claim 30, wherein the parameter is a difference between two sets of measurement results obtained using two substrate measurement recipes with different wavelengths of the incident radiation.

### Claim 36 (depends on 30)

The method of claim 30, wherein determining the parameter value comprising determining the parameter value based on a relationship of an optical path length of the target for incident radiation used in accordance with the substrate measurement recipe to a relative change of wavelength of the incident radiation used in accordance with the substrate measurement recipe.