Systems and Methods for Priming Fluid Circuits of a Plasma Processing System

A method of priming a plasma processing system comprising at least a first fluid flow path, a second fluid flow path, third fluid flow path, and a fourth fluid flow path, comprising:

• flushing a first fluid circuit, wherein the first fluid circuit is defined by a source of a first fluid, a first valve positioned between the source of the first fluid and the first fluid flow path, a second valve positioned between the first fluid flow path and the second fluid flow path, a first pump positioned between the second fluid flow path and the third fluid flow path, and a first waste container in fluid communication with the third fluid flow path;
• and
• flushing a second fluid circuit, wherein the second fluid circuit is defined by a source of a second fluid, a third valve, wherein the third valve is positioned between the first fluid flow path and the fourth fluid flow path, and a fourth valve, wherein the fourth valve is positioned between a source of a second fluid and the first fluid flow path, by closing the second valve, thereby preventing a flow of fluid to the second fluid flow path, third fluid flow path, and first waste container, closing the first valve, thereby preventing a flow of the first fluid to the first fluid flow path from the source of the first fluid, opening the third valve, and opening the fourth valve.