Thermal chamber exhaust structure and method
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsHsien-Chang HSIEH, Chun-Chih LIN, Tah-te SHIH, Wen-Hsong WU, Chune-Te YANG, Yu-Jen SU
Life of this patent
Estimating the term…
Loading patent…
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsHsien-Chang HSIEH, Chun-Chih LIN, Tah-te SHIH, Wen-Hsong WU, Chune-Te YANG, Yu-Jen SU
Estimating the term…
An exhaust structure includes an intake section which includes an inlet, an output section which includes an outlet, and a piping section coupled to the intake section and the output section at a section interface. The piping section includes a first inner diameter from the intake section to the output section, wherein one of the intake section or the output section has a second inner diameter at the section interface. The second inner diameter includes a same value as a value of the first inner diameter. A plurality of smoothing layers are configured to resist turbulence and condensation produced by a flow of one or more gasses in the intake section, the output section, and the piping section.
An exhaust structure comprising:
A thermal chamber system comprising:
An exhaust structure comprising:
Dependencies are inferred from the claim text.