Curable composition for use in a high temperature lithography-based photopolymerization process and method of producing crosslinked polymers therefrom
AssigneeAlign Technology, Inc.
InventorsRobert LISKA, Christian GORSCHE, György HARAKALY, Markus KURY, Jürgen STAMPFL, Peter DORFINGER, Yan CHEN, Chunhua LI, Srinivas KAZA
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Abstract
Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.
Claims133
A curable composition for use in a photopolymerization process, the composition comprising:
- a toughness modifier, wherein the toughness modifier is a polymerizable oligomer having a number average molecular weight of greater than 5 kDa;
- and
- a reactive diluent, wherein the reactive diluent is a polymerizable compound having a molecular weight of 0.1 to 1.0 kDa and wherein the content of the reactive diluent is such that the viscosity of the composition is 1 to 70 Pa·s at 110° C.
A curable composition for use in a photopolymerization process, the composition comprising:
- a toughness modifier, wherein the toughness modifier is a polymerizable oligomer having a number average molecular weight of greater than 5 kDa;
- and
- a reactive diluent, wherein the reactive diluent is a polymerizable compound having a molecular weight of 0.1 to 1.0 kDa and wherein the content of the reactive diluent is such that the viscosity of the composition is less than 70 Pa·s at 90° C.
A crosslinked polymer for use in an orthodontic appliance, wherein the crosslinked polymer is characterized by one or more of:
- a stress relaxation of greater than or equal to 5% of the initial load;
- and
- a glass transition temperature of greater than or equal to 90° C.
A curable composition for use in a high temperature lithography-based photopolymerization process, said composition comprising the following polymerizable Components A to C,
- Component A being at least one oligomeric dimethacrylate according to the following chemical formula (I), serving as a glass transition temperature modifier:
- wherein:
- each R1 and each R2 independently represent a divalent, linear, branched or cyclic C5-C15 aliphatic radical, with the proviso that at least one of R1 and R2 is or comprises a C5-C6 cycloaliphatic structure,
- each R3 independently represents a divalent, linear or branched C2-C4 alkyl radical, and
- n is an integer from 1 to 5,
- with the proviso that R1, R2, R3 and n are selected so as to result in a number average molecular weight of the oligomeric dimethacrylate from 0.4 to 5 kDa;
- Component B being at least one, optionally polyether-modified, (poly)carbonate-(poly)urethane dimethacrylate according to any one of the following chemical formulas (II), (III), (IV) or (V), serving as a toughness modifier:
- wherein:
- each R4 and each R5 independently represent a divalent, linear, branched or cyclic C5-C15 aliphatic radical,
- each R6 independently represents a divalent, linear or branched C2-C4 alkyl radical,
- each R7 independently represents a divalent, linear or branched C2-C6 alkyl radical,
- each n is independently an integer from 1 to 10,
- each m is independently an integer from 1 to 20,
- each o is independently an integer from 5 to 50, and
- p is an integer from 1 to 40,
- with the proviso that R4, R5, R6, R7, n, m, o and p are selected so as to result in a number average molecular weight of the (poly)carbonate-(poly)urethane dimethacrylate greater than 5 kDa;
- and
- Component C being at least one mono- or multifunctional methacrylate-based reactive diluent.
Dependencies are inferred from the claim text.