Thin layer deposition process
OwnerNisita WANAKULE, Constance MAGNE +1inventors
InventorsNisita WANAKULE, Constance MAGNE, Clément BOTTOIS
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Abstract
A process for obtaining a material includes a substrate coated with a photocatalytic coating, the process including depositing on the substrate, by sputtering, a stack of thin layers successively including a first layer of titanium metal having a thickness of from 1 to 3 nm, an intermediate layer of at least partially oxidized titanium having a thickness of from 0.5 to 5 nm, and a second layer of titanium metal having a thickness of from 2 to 5 nm; and oxidizing the stack, with the aid of a heat treatment by laser radiation, wherein the stack is in contact with an oxidizing atmosphere.
Claims17
A process for obtaining a material comprising a substrate coated with a photocatalytic coating, said process comprising:
- depositing on said substrate, by sputtering, a stack of thin layers successively comprising a first layer of titanium metal having a thickness of from 1 to 3 nm, an intermediate layer of at least partially oxidized titanium having a thickness of from 0.5 to 5 nm, and a second layer of titanium metal having a thickness of from 2 to 5 nm;
- and
- oxidizing said stack, with the aid of a heat treatment by laser radiation, wherein the stack is in contact with an oxidizing atmosphere.
A material comprising a substrate coated with a stack of thin layers successively comprising a first layer of titanium metal having a thickness of from 1 to 3 nm, an intermediate layer of at least partially oxidized titanium having a thickness of from 0.5 to 5 nm, and a second layer of titanium metal having a thickness of from 2 to 5 nm.
Dependencies are inferred from the claim text.