Hydrophilic and zeta potential tunable chemical mechanical polishing pads
AssigneeApplied Materials, Inc.
InventorsSivapackia GANAPATHIAPPAN, Boyi FU, Ashwin CHOCKALINGAM, Ankit VORA, Daniel REDFIELD, Rajeev BAJAJ, Nag B. PATIBANDLA, Hou T. NG, Sudhakar MADHUSOODHANAN
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