# US 2019/0318904 A1 · Ion source, ion beam irradiation apparatus, and operating method for ion source

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- Number: US 2019/0318904 A1
- Document ID: US20190318904A1
- Status: Published application
- Kind: A1
- Application number: 16/256,124
- Filed: 2019-01-24
- Published: 2019-10-17
- Earliest claimed: 2018-04-12
- Assignees: Nissin Ion Equipment Co., Ltd.
- Applicants: Nissin Ion Equipment Co., Ltd.
- Inventors: Tetsuro YAMAMOTO
- Web page: https://patentgrep.com/patent/US20190318904A1

## CPC

- H01J 37/08: Ion sources; Ion guns
- H01J 37/05: Electron or ion-optical arrangements for separating electrons or ions according to their energy {or mass}(particle separator tubes H01J49/00)
- H01J 2237/024: Moving components not otherwise provided for
- H01J 2237/061: Construction
- H01J 2237/31701: Ion implantation
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)

## Abstract

An ion source is provided. The ion source includes a plasma generation container, an electron supply, an electromagnet and a shift means. The plasma generation container generates an ion beam to be extracted therefrom in an ion beam extraction direction. The electron supply supplies electrons into the plasma generation container. The electromagnet generates a magnetic field for capturing the electrons from the electron supply. The shift means shifts a center of the magnetic field in the ion beam extraction direction to change a rate of a desired type of ion to be contained in the ion beam.

## Claims

### Claim 1

An ion source comprising:
a plasma generation container that generates an ion beam to be extracted therefrom in an ion beam extraction direction;
an electron supply that supplies electrons into the plasma generation container;
an electromagnet that generates a magnetic field for capturing the electrons from the electron supply; and
shift means for shifting a center of the magnetic field in the ion beam extraction direction to change a rate of a desired type of ion to be contained in the ion beam.

### Claim 2 (depends on 1)

The ion source as recited in claim 1, wherein the shift means displaces a center of the electromagnet in the ion beam extraction direction.

### Claim 3 (depends on 1)

The ion source as recited in claim 1, wherein the shift means comprises a plurality of electromagnets arranged at different positions in the ion beam extraction direction.

### Claim 4 (depends on 3)

The ion source as recited in claim 3, wherein the shift means shifts a center of the magnetic field in the ion beam extraction direction by adjusting a magnetic density of a magnetic field generated by each of the plurality of electromagnets.

### Claim 5 (depends on 1)

The ion source as recited in claim 1, wherein the shift means comprises a detachable magnetic shield that shields the magnetic field of the electromagnet.

### Claim 6 (depends on 5)

The ion source as recited in claim 5, wherein the magnetic shield is disposed on one side or on each of opposite sides of the electromagnet in the ion beam extraction direction.

### Claim 7 (depends on 5)

The ion source as recited in claim 5, wherein a distance between the electromagnet and the detachable magnetic shield is variably set in the ion beam extraction direction.

### Claim 8 (depends on 1)

An ion beam irradiation apparatus comprising the ion source as recited in claim 1.

### Claim 9

A method of operating an ion source that includes a plasma generation container that generates an ion beam to be extracted therefrom in an ion beam extraction direction; an electron supply that supplies electrons into the plasma generation container; and an electromagnet that generates a magnetic field for capturing the electrons from the electron supply, the method comprising:
shifting a center of the magnetic field in the ion beam extraction direction to change a rate of a desired type of ion to be contained in the ion beam.

### Claim 10

An ion source comprising:
a plasma generation container;
an electron supply that supplies electrons into the plasma generation container;
two electromagnets, disposed at opposite sides of the plasma generation container in a first direction that is orthogonal to an ion beam extraction direction, that generate a magnetic field for capturing the electrons from the electron supply; and
a detachable magnetic shield attached to at least one of the two electromagnets.

### Claim 11 (depends on 10)

The ion source as recited in claim 10, wherein the detachable magnetic shield is attached to the two electromagnets.

### Claim 12 (depends on 10)

The ion source as recited in claim 10, further comprising a spacer provided between the magnetic shield and the at least one of the two electromagnets.

### Claim 13 (depends on 10)

The ion source as recited in claim 10, wherein the detachable magnetic shield is disposed on one side or on each of opposite sides of the at least one of the two electromagnets in the ion beam extraction direction.

### Claim 14 (depends on 10)

The ion source as recited in claim 10, wherein the detachable magnetic shield comprises a plurality of detachable magnetic shields, one detachable magnetic shield attached to each end in the ion extraction direction of the at least one of the two electromagnets.

### Claim 15 (depends on 10)

The ion source as recited in claim 10, wherein a distance between the at least one of the two electromagnets and the detachable magnetic shield is variably set in the ion beam extraction direction.