Method for producing a metal stamp for embossing a nano-and/or microstructure on a metal device as well as uses thereof and devices made therewith

Method for producing a metal stamp for embossing a nano- and/or microstructure on a metal device, wherein the method comprises at least the following steps in given order for producing a 3D topologically structured embossing area on at least a surface portion of the metal stamp:

• a) providing a master tool having a master 3D topologically structured surface representing said nano- and/or microstructure, and replicating said master 3D topologically structured surface in the surface of a soft stamp to form a soft stamp 3D topologically structured surface;
• b) forming an imprint on the soft stamp 3D topologically structured surface using a polymerizable and/or cross-linkable organic imprint material to form an imprint 3D topologically structured surface on one face of the imprint, before, while or after contacting an opposite side of the imprint with said surface portion of the metal stamp, and removing said soft-stamp exposing said imprint 3D topologically structured surface;
• c) etch-opening said imprint 3D topologically structured surface to expose back to air only most recessed portions of the imprint 3D topologically structured surface using a first set of etching conditions;
• d) using a second set of etching conditions, different from the first ones, etching the metal surface of the metal stamp to form said 3D topologically structured embossing area.