Method for patterning quantum dot layer, method for manufacturing display device and transfer template
AssigneeBoe Technology Group Co., Ltd.
InventorsZhuo CHEN, Yuanming ZHANG, Wenhai MEI
Life of this patent
Estimating the term…
Abstract
A method for patterning a quantum dot layer, a method for manufacturing a display device and a transfer template are provided in embodiments of the disclosure; the method for patterning a quantum dot layer, comprising: preparing a quantum dot layer on a substrate, the quantum dot layer comprising a reserved portion and a portion to be removed; bonding the portion to be removed with a plurality of convex portions provided on a transfer template, by pressing the transfer template against the quantum dot layer; and removing the portion to be removed with a removal of the transfer template, while retaining the reserved portion on the substrate.
Claims18
A method for patterning a quantum dot layer, comprising:
- preparing a quantum dot layer on a substrate, the quantum dot layer comprising:
- a reserved portion and a portion to be removed;
- bonding the portion to be removed with a plurality of convex portions provided on a transfer template, by pressing the transfer template against the quantum dot layer;
- and
- removing the portion to be removed with a removal of the transfer template, while retaining the reserved portion on the substrate.
A transfer template, comprising:
- a transfer template body having a plurality of convex portions;
- and
- second groups which are dispersed in the plurality of convex portions and are bondable with adjacent groups different therefrom, by chemical bonds;
- wherein a material of the transfer template having the second groups is formed into the transfer template, the transfer template being formed with the plurality of the convex portions having the plurality of second groups.
Dependencies are inferred from the claim text.