Array substrate and method for manufacturing same

A method for manufacturing an array substrate, comprising:

• a step S1 of providing a base plate and forming a metal light-shielding layer on the base plate, the metal light-shielding layer including a plurality of portions spaced from each other;
• a step S2 of forming a first buffer layer having a thickness identical to a thickness of the metal light-shielding layer on the base plate, and patterning the first buffer layer to remove a portion of the first buffer layer corresponding to and disposed above the metal light-shielding layer, such that the patterned first buffer layer is coplanar with the metal light-shielding layer;
• a step S3 of forming a second buffer layer having a predetermined thickness on the patterned first buffer layer and the metal light-shielding layer;
• and
• a step S4 of forming a polysilicon layer on the second buffer layer to correspond to the metal light-shielding layer, wherein a thickness of the polysilicon layer is uniform.

An array substrate, comprising:

• a base plate;
• a metal light-shielding layer disposed on a surface of the base plate;
• and
• a polysilicon layer disposed on the metal light-shielding layer;
• wherein an area of the metal light-shielding layer is greater than or equal to an area of the polysilicon layer, and a projection of the polysilicon layer on the metal light-shielding layer falls within a region constricted by the metal light-shielding layer.