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US 2019/0296131 A1Published application
Method of Manufacture of Germanium-Silicon-Tin Heterojunction Bipolar Transistor Devices
OwnerMatthew H. Kiminventor
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Abstract
The methods of manufacture of GeSiSn heterojunction bipolar transistors, which include light emitting transistors and transistor lasers and photo-transistors and their related structures are described herein. Other embodiments are also disclosed herein.
Claims21
A heterojunction bipolar transistor comprising:
- a GeSiSn base region;
- an emitter region;
- and
- a collector region.
1 more element
A method of manufacturing a heterojunction bipolar transistor comprising:
- forming a GeSiSn base region;
- forming an emitter region;
- and
- forming a collector region.
1 more element
A bipolar transistor comprising:
- a GeSiSn base region;
- an emitter region;
- and
- a collector region
1 more element
A method of manufacturing a bipolar transistor, the method comprising:
- providing a GeSiSn base region wafer bonded to the collector region.
Dependencies are inferred from the claim text.