Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
AssigneeKokusai Electric Corporation
InventorYukitomo HIROCHI
Life of this patent
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Abstract
According to one aspect of technique described herein, there is provided a technique including; a process chamber in which at least one substrate is processed; an electromagnetic wave supply part configured to supply an electromagnetic wave to the at least one substrate; a substrate holding part configured to hold the at least one substrate and at least one susceptor for suppressing the electromagnetic wave from being adsorbed to an edge of the at least one substrate; a substrate transfer part configured to transfer the at least one substrate; and a controller configured to control the substrate transfer part so as to correct a position of the at least one susceptor.
Claims18
A substrate processing apparatus, comprising:
- a process chamber in which at least one substrate is processed;
- an electromagnetic wave supply part configured to supply an electromagnetic wave to the at least one substrate;
- a substrate holding part configured to hold the at least one substrate and at least one susceptor for suppressing the electromagnetic wave from being adsorbed to an edge of the at least one substrate;
- a substrate transfer part configured to transfer the at least one substrate;
- and
- a controller configured to control the substrate transfer part so as to correct a position of the at least one susceptor.
A method of manufacturing a semiconductor device, comprising:
- a loading step of loading a substrate into a process chamber of a substrate processing apparatus which includes the process chamber in which the substrate is processed, an electromagnetic wave supply part configured to supply an electromagnetic wave to the substrate, a substrate holding part configured to hold the substrate and a susceptor for suppressing the electromagnetic wave from being adsorbed to an edge of the substrate, and a substrate transfer part configured to transfer the substrate;
- a processing step of processing the substrate with the electromagnetic wave;
- an unloading step of unloading the substrate from the process chamber;
- and
- a correction step of correcting a position of the susceptor by the substrate transfer part.
A non-transitory computer-readable recording medium storing a program that causes a substrate processing apparatus to perform a process by a computer, the process comprising:
- loading a substrate into a process chamber of the substrate processing apparatus which includes the process chamber in which the substrate is processed, an electromagnetic wave supply part configured to supply an electromagnetic wave to the substrate, a substrate holding part configured to hold the substrate and a susceptor for suppressing the electromagnetic wave from being adsorbed to an edge of the substrate, and a substrate transfer part configured to transfer the substrate;
- processing the substrate;
- unloading the substrate from the process chamber;
- and
- correcting a position of the susceptor by the substrate transfer part.
Dependencies are inferred from the claim text.